Issued Patents All Time
Showing 101–125 of 151 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9466469 | Remote plasma source for controlling plasma skew | Abdul Aziz Khaja, Mohamad A. Ayoub, Ramesh Bokka, Jay D. Pinson, II | 2016-10-11 |
| 9458537 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2016-10-04 |
| 9428424 | Critical chamber component surface improvement to reduce chamber particles | Ren-Guan Duan, Ramprakash Sankarakrishnan | 2016-08-30 |
| 9384950 | Chamber coatings | Ren-Guan Duan, Jianhua Zhou, Ningli Liu, Yihong Chen, Abhijit Basu Mallick +1 more | 2016-07-05 |
| 9364871 | Method and hardware for cleaning UV chambers | Sanjeev Baluja, Alexandros T. Demos, Kelvin Chan, Scott A. Hendrickson, Abhijit A. Kangude +6 more | 2016-06-14 |
| 9305749 | Methods of directing magnetic fields in a plasma source, and associated systems | Zheng John Ye, Jay D. Pinson, II, Hiroji Hanawa | 2016-04-05 |
| 9206511 | Method and system for supplying a cleaning gas into a process chamber | Ramprakash Sankarakrishnan, Dale R. Du Bois, Ganesh Balasubramanian, Karthik Janakiraman, Thomas Nowak +2 more | 2015-12-08 |
| 9157730 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2015-10-13 |
| 8911553 | Quartz showerhead for nanocure UV chamber | Sanjeev Baluja, Alexandros T. Demos, Thomas Nowak, Jianhua Zhou | 2014-12-16 |
| 8884524 | Apparatus and methods for improving reliability of RF grounding | Jianhua Zhou, Dale R. Du Bois, Mohamad A. Ayoub | 2014-11-11 |
| 8778813 | Confined process volume PECVD chamber | Ramprakash Sankarakrishnan, Ganesh Balasubramanian, Dale R. Du Bois, Mark Fodor, Jianhua Zhou +6 more | 2014-07-15 |
| 8753449 | Enhancement in UV curing efficiency using oxygen-doped purge for ultra low-K dielectric film | Mahendra CHHABRA, Scott A. Hendrickson, Sanjeev Baluja, Tsutomu Kiyohara, Alexandros T. Demos | 2014-06-17 |
| 8679987 | Deposition of an amorphous carbon layer with high film density and high etch selectivity | Patrick Reilly, Shahid Shaikh, Tersem Summan, Deenesh Padhi, Sanjeev Baluja +3 more | 2014-03-25 |
| 8664061 | Pulse method of oxidizing sidewall dielectrics for high capacitance applications | Bo Xie, Alexandros T. Demos, Sanjeev Baluja | 2014-03-04 |
| 8657961 | Method for UV based silylation chamber clean | Bo Xie, Alexandros T. Demos, Scott A. Hendrickson, Sanjeev Baluja | 2014-02-25 |
| 8597011 | Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections | Andrzei Kaszuba, Thomas Nowak, Sanjeev Baluja, Ashish Shah, Inna Shmurun | 2013-12-03 |
| 8591699 | Method and system for supplying a cleaning gas into a process chamber | Ramprakash Sankarakrishnan, Dale R. Du Bois, Ganesh Balasubramanian, Karthik Janakiraman, Thomas Nowak +2 more | 2013-11-26 |
| 8455849 | Method and apparatus for modulating wafer treatment profile in UV chamber | Sanjeev Baluja, Alexandros T. Demos | 2013-06-04 |
| 8382885 | Fluid filtration for substrate processing chamber | Dustin W. Ho, Hichem M'Saad | 2013-02-26 |
| 8343881 | Silicon dioxide layer deposited with BDEAS | Yong Won Lee, Vladimir Zubkov, Mei-Yee Shek, Li-Qun Xia, Prahallad Iyengar +4 more | 2013-01-01 |
| 8309421 | Dual-bulb lamphead control methodology | Yao-Hung YANG, Abhijit A. Kangude, Sanjeev Baluja, Michael A. Martinelli, Liliya Krivulina +2 more | 2012-11-13 |
| 8274017 | Multifunctional heater/chiller pedestal for wide range wafer temperature control | Lipyeow Yap, Tuan Nguyen, Dale R. Du Bois, Sanjeev Baluja, Thomas Nowak +1 more | 2012-09-25 |
| 8203126 | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation | Thomas Nowak, Dale R. Du Bois, Sanjeev Baluja, Scott A. Hendrickson, Dustin W. Ho +2 more | 2012-06-19 |
| 7947611 | Method of improving initiation layer for low-k dielectric film by digital liquid flow meter | Dustin W. Ho, Alexandros T. Demos, Kelvin Chan, Nagarajan Rajagopalan, Visweswaren Sivaramakrishnan | 2011-05-24 |
| 7909595 | Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections | Andrzei Kaszuba, Thomas Nowak, Sanjeev Baluja, Ashish Shah, Inna Shmurun | 2011-03-22 |