Issued Patents 2020
Showing 25 most recent of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10832945 | Techniques to improve critical dimension width and depth uniformity between features with different layout densities | Nicole Saulnier, Indira Seshadri, Lawrence A. Clevenger, Leigh Anne H. Clevenger, Gauri Karve +3 more | 2020-11-10 |
| 10833190 | Super long channel device within VFET architecture | Marc A. Bergendahl, Kangguo Cheng, Gauri Karve, Eric R. Miller, John R. Sporre +1 more | 2020-11-10 |
| 10833010 | Integration of artificial intelligence devices | Hsueh-Chung Chen, Lawrence A. Clevenger, Effendi Leobandung | 2020-11-10 |
| 10818751 | Nanosheet transistor barrier for electrically isolating the substrate from the source or drain regions | Mona A. Ebrish, Nicolas Loubet, Gauri Karve, Indira Seshadri, Lawrence A. Clevenger +1 more | 2020-10-27 |
| 10818663 | Fabrication of fin field effect transistors for complementary metal oxide semiconductor devices including separate n-type and p-type source/drains using a single spacer deposition | Kangguo Cheng, Eric R. Miller, Sean Teehan | 2020-10-27 |
| 10811507 | Vertical transistors having multiple gate thicknesses for optimizing performance and device density | Brent A. Anderson, Stuart A. Sieg, Junli Wang | 2020-10-20 |
| 10811508 | Vertical transistors having multiple gate thicknesses for optimizing performance and device density | Brent A. Anderson, Stuart A. Sieg, Junli Wang | 2020-10-20 |
| 10741673 | Controlling gate profile by inter-layer dielectric (ILD) nanolaminates | Michael P. Belyansky, Andrew M. Greene, Huimei Zhou | 2020-08-11 |
| 10741647 | Conformal doping for punch through stopper in fin field effect transistor devices | Huiming Bu, Sivananda K. Kanakasabapathy, Tenko Yamashita | 2020-08-11 |
| 10734523 | Nanosheet substrate to source/drain isolation | Mona A. Ebrish, Ekmini Anuja De Silva, Indira Seshadri, Gauri Karve, Lawrence A. Clevenger +2 more | 2020-08-04 |
| 10672668 | Dual width finned semiconductor structure | Yi Song, Jay William Strane, Eric R. Miller, Richard A. Conti | 2020-06-02 |
| 10628404 | Vertical transistor and method of forming the vertical transistor | Shogo Mochizuki, Junli Wang | 2020-04-21 |
| 10629443 | Bottom source/drain silicidation for vertical field-effect transistor (FET) | Brent A. Anderson, Huiming Bu, Terence B. Hook, Junli Wang | 2020-04-21 |
| 10629698 | Method and structure for enabling high aspect ratio sacrificial gates | Kangguo Cheng, Ryan O. Jung, Jeffrey C. Shearer, John R. Sporre, Sean Teehan | 2020-04-21 |
| 10622250 | Dielectric gap fill evaluation for integrated circuits | Isabel Cristina Chu, Lawrence A. Clevenger, Leigh Anne H. Clevenger, Ekmini Anuja De Silva, Gauri Karve +3 more | 2020-04-14 |
| 10615278 | Preventing strained fin relaxation | Kangguo Cheng, Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve +3 more | 2020-04-07 |
| 10615269 | Nanosheet channel-to-source and drain isolation | Marc A. Bergendahl, Kangguo Cheng, Eric R. Miller, John R. Sporre, Sean Teehan | 2020-04-07 |
| 10607991 | Air gap spacer for metal gates | Marc A. Bergendahl, Kangguo Cheng, Eric R. Miller, John R. Sporre, Sean Teehan | 2020-03-31 |
| 10593782 | Self-aligned finFET formation | Cheng Chi, Chi-Chun Liu, Ruilong Xie | 2020-03-17 |
| 10593803 | Self-aligned shallow trench isolation and doping for vertical fin transistors | Brent A. Anderson, Junli Wang | 2020-03-17 |
| 10573727 | Vertical transistor device | Brent A. Anderson, Huiming Bu, Shogo Mochizuki, Junli Wang | 2020-02-25 |
| 10573745 | Super long channel device within VFET architecture | Marc A. Bergendahl, Kangguo Cheng, Gauri Karve, Eric R. Miller, John R. Sporre +1 more | 2020-02-25 |
| 10573528 | Two-color self-aligned double patterning (SADP) to yield static random access memory (SRAM) and dense logic | Dongbing Shao, Robert C. Wong, Yongan Xu | 2020-02-25 |
| 10553516 | Semiconductor microcooler | Donald F. Canaperi, Daniel A. Corliss, Dario L. Goldfarb, Dinesh Gupta, Kamal K. Sikka | 2020-02-04 |
| 10553522 | Semiconductor microcooler | Donald F. Canaperi, Daniel A. Corliss, Dario L. Goldfarb, Dinesh Gupta, Kamal K. Sikka | 2020-02-04 |