| 10840247 |
Orientation engineering in complementary metal oxide semiconductor fin field effect transistor integration for increased mobility and sharper junction |
Chia-Yu Chen, Bruce B. Doris, Rajasekhar Venigalla |
2020-11-17 |
| 10790393 |
Utilizing multilayer gate spacer to reduce erosion of semiconductor Fin during spacer patterning |
Andrew M. Greene, Sivananda K. Kanakasabapathy, Gauri Karve, Eric R. Miller, Pietro Montanini |
2020-09-29 |
| 10777557 |
Orientation engineering in complementary metal oxide semiconductor fin field effect transistor integration for increased mobility and sharper junction |
Chia-Yu Chen, Bruce B. Doris, Rajasekhar Venigalla |
2020-09-15 |
| 10734504 |
Integration of strained silicon germanium PFET device and silicon NFET device for finFET structures |
Bruce B. Doris, Nicolas Loubet, Junli Wang |
2020-08-04 |
| 10734385 |
Orientation engineering in complementary metal oxide semiconductor fin field effect transistor integration for increased mobility and sharper junction |
Chia-Yu Chen, Bruce B. Doris, Rajasekhar Venigalla |
2020-08-04 |
| 10714596 |
Directional deposition of protection layer |
Juntao Li, Junli Wang, Chih-Chao Yang |
2020-07-14 |
| 10658391 |
Hybrid substrate engineering in CMOS finFET integration for mobility improvement |
Chia-Yu Chen, Bruce B. Doris, Rajasekhar Venigalla |
2020-05-19 |
| 10629431 |
Method and structure for forming a dense array of single crystalline semiconductor nanocrystals |
Kangguo Cheng, Juntao Li |
2020-04-21 |
| 10615278 |
Preventing strained fin relaxation |
Kangguo Cheng, Bruce B. Doris, Sivananda K. Kanakasabapathy, Gauri Karve, Juntao Li +3 more |
2020-04-07 |
| 10566454 |
Self-aligned contact process enabled by low temperature |
Chiahsun Tseng, Chun-Chen Yeh, Yunpeng Yin |
2020-02-18 |
| 10559662 |
Hybrid aspect ratio trapping |
Kangguo Cheng, Ramachandra Divakaruni, Juntao Li |
2020-02-11 |
| 10529717 |
Orientation engineering in complementary metal oxide semiconductor fin field effect transistor integration for increased mobility and sharper junction |
Chia-Yu Chen, Bruce B. Doris, Rajasekhar Venigalla |
2020-01-07 |
| 10529858 |
FinFET with merge-free fins |
Chiahsun Tseng, Junli Wang, Chun-Chen Yeh, Yunpeng Yin |
2020-01-07 |
| 10529829 |
Silicon germanium alloy fins with reduced defects |
Kangguo Cheng, Juntao Li |
2020-01-07 |
