| 10847569 |
Wafer level shim processing |
Jeffery H. Burkhart, Sean P. Kilcoyne |
2020-11-24 |
| 10833190 |
Super long channel device within VFET architecture |
Marc A. Bergendahl, Kangguo Cheng, Gauri Karve, Fee Li Lie, John R. Sporre +1 more |
2020-11-10 |
| 10818663 |
Fabrication of fin field effect transistors for complementary metal oxide semiconductor devices including separate n-type and p-type source/drains using a single spacer deposition |
Kangguo Cheng, Fee Li Lie, Sean Teehan |
2020-10-27 |
| 10790393 |
Utilizing multilayer gate spacer to reduce erosion of semiconductor Fin during spacer patterning |
Andrew M. Greene, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Pietro Montanini |
2020-09-29 |
| 10741452 |
Controlling fin hardmask cut profile using a sacrificial epitaxial structure |
Stuart A. Sieg, Yann Mignot, Indira Seshadri, Christopher J. Waskiewicz |
2020-08-11 |
| 10692776 |
Formation of VTFET fin and vertical fin profile |
Marc A. Bergendahl, Kangguo Cheng, Yann Mignot |
2020-06-23 |
| 10672668 |
Dual width finned semiconductor structure |
Yi Song, Jay William Strane, Fee Li Lie, Richard A. Conti |
2020-06-02 |
| 10615269 |
Nanosheet channel-to-source and drain isolation |
Marc A. Bergendahl, Kangguo Cheng, Fee Li Lie, John R. Sporre, Sean Teehan |
2020-04-07 |
| 10607991 |
Air gap spacer for metal gates |
Marc A. Bergendahl, Kangguo Cheng, Fee Li Lie, John R. Sporre, Sean Teehan |
2020-03-31 |
| 10573745 |
Super long channel device within VFET architecture |
Marc A. Bergendahl, Kangguo Cheng, Gauri Karve, Fee Li Lie, John R. Sporre +1 more |
2020-02-25 |
| 10553581 |
Air gap spacer for metal gates |
Marc A. Bergendahl, Kangguo Cheng, Fee Li Lie, John R. Sporre, Sean Teehan |
2020-02-04 |
| 10535529 |
Semiconductor fin length variability control |
Praveen Joseph, Ekmini Anuja De Silva, Stuart A. Sieg |
2020-01-14 |
