Issued Patents 2020
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10832919 | Measuring and modeling material planarization performance | Romain Lallement | 2020-11-10 |
| 10811508 | Vertical transistors having multiple gate thicknesses for optimizing performance and device density | Brent A. Anderson, Fee Li Lie, Junli Wang | 2020-10-20 |
| 10811507 | Vertical transistors having multiple gate thicknesses for optimizing performance and device density | Brent A. Anderson, Fee Li Lie, Junli Wang | 2020-10-20 |
| 10741452 | Controlling fin hardmask cut profile using a sacrificial epitaxial structure | Eric R. Miller, Yann Mignot, Indira Seshadri, Christopher J. Waskiewicz | 2020-08-11 |
| 10734372 | Vertical transport static random-access memory cells with transistors of active regions arranged in linear rows | Brent A. Anderson, Junli Wang | 2020-08-04 |
| 10665715 | Controlling gate length of vertical transistors | Praveen Joseph, Indira Seshadri, Ekmini Anuja De Silva | 2020-05-26 |
| 10642950 | Verifying planarization performance using electrical measures | Romain Lallement | 2020-05-05 |
| 10629489 | Approach to prevent collapse of high aspect ratio Fin structures for vertical transport Fin field effect transistor devices | Indira Seshadri, Praveen Joseph, Ekmini Anuja De Silva | 2020-04-21 |
| 10622248 | Tunable hardmask for overlayer metrology contrast | Ekmini Anuja De Silva, Nelson Felix, Indira Seshadri | 2020-04-14 |
| 10580652 | Alternating hardmasks for tight-pitch line formation | John C. Arnold, Anuja E. DeSilva, Nelson Felix, Chi-Chun Liu, Yann Mignot | 2020-03-03 |
| 10535529 | Semiconductor fin length variability control | Praveen Joseph, Ekmini Anuja De Silva, Eric R. Miller | 2020-01-14 |