Issued Patents 2020
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10831102 | Photoactive polymer brush materials and EUV patterning using the same | Ekmini Anuja De Silva, Rudy J. Wojtecki, Dario L. Goldfarb, Daniel P. Sanders | 2020-11-10 |
| 10768532 | Co-optimization of lithographic and etching processes with complementary post exposure bake by laser annealing | Jing Sha, Ekmini Anuja De Silva, Derren N. Dunn | 2020-09-08 |
| 10755928 | Fabricating electrically nonconductive blocks using a polymer brush and a sequential infiltration synthesis process | Chi-Chun Liu, Kristin Schmidt, Yann Mignot, Martha I. Sanchez, Daniel P. Sanders +1 more | 2020-08-25 |
| 10755926 | Patterning directly on an amorphous silicon hardmask | Abraham Arceo de la Pena, Ekmini Anuja De Silva | 2020-08-25 |
| 10748823 | Embedded etch rate reference layer for enhanced etch time precision | Yann Mignot, Alan C. Thomas, Daniel P. Sanders, Dario L. Goldfarb, Chi-Chun Liu +1 more | 2020-08-18 |
| 10741454 | Boundary protection for CMOS multi-threshold voltage devices | Jing Guo, Ekmini Anuja De Silva, Nicolas Loubet, Indira Seshadri | 2020-08-11 |
| 10727055 | Method to increase the lithographic process window of extreme ultra violet negative tone development resists | Martin Glodde, Dario L. Goldfarb | 2020-07-28 |
| 10658521 | Enabling residue free gap fill between nanosheets | Indira Seshadri, Ekmini Anuja De Silva, Jing Guo, Ruqiang Bao, Muthumanickam Sankarapandian | 2020-05-19 |
| 10656527 | Patterning material film stack with hard mask layer configured to support selective deposition on patterned resist layer | Ekmini Anuja De Silva, Indira Seshadri, Jing Guo, Ashim Dutta | 2020-05-19 |
| 10622248 | Tunable hardmask for overlayer metrology contrast | Ekmini Anuja De Silva, Indira Seshadri, Stuart A. Sieg | 2020-04-14 |
| 10586697 | Wet strippable OPL using reversible UV crosslinking and de-crosslinking | Ekmini Anuja De Silva, Jing Guo, Indira Seshadri | 2020-03-10 |
| 10580652 | Alternating hardmasks for tight-pitch line formation | John C. Arnold, Anuja E. DeSilva, Chi-Chun Liu, Yann Mignot, Stuart A. Sieg | 2020-03-03 |
| 10578981 | Post-lithography defect inspection using an e-beam inspection tool | Luciana Meli Thompson, Ekmini Anuja De Silva, Yasir Sulehria | 2020-03-03 |
| 10545409 | Dynamic adjustment of post exposure bake during lithography utilizing real-time feedback for wafer exposure delay | Cody J. Murray, Ekmini Anuja De Silva, Alex Richard Hubbard, Karen E. Petrillo | 2020-01-28 |
| 10529569 | Self aligned pattern formation post spacer etchback in tight pitch configurations | Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Sivananda K. Kanakasabapathy, Christopher J. Penny +2 more | 2020-01-07 |