| 10879068 |
Extreme ultraviolet lithography for high volume manufacture of a semiconductor device |
Yongan Xu, Yann Mignot, Oleg Gluschenkov |
2020-12-29 |
| 10833258 |
MRAM device formation with in-situ encapsulation |
Ashim Dutta, Chih-Chao Yang, Daniel C. Edelstein, Karthik Yogendra |
2020-11-10 |
| 10833257 |
Formation of embedded magnetic random-access memory devices with multi-level bottom electrode via contacts |
Ashim Dutta, Chih-Chao Yang, Theodorus E. Standaert |
2020-11-10 |
| 10748823 |
Embedded etch rate reference layer for enhanced etch time precision |
Yann Mignot, Alan C. Thomas, Daniel P. Sanders, Dario L. Goldfarb, Nelson Felix +1 more |
2020-08-18 |
| 10714683 |
Multilayer hardmask for high performance MRAM devices |
Michael Rizzolo, Daniel C. Edelstein, Theodorus E. Standaert, Kisup Chung, Isabel Cristina Chu |
2020-07-14 |
| 10707413 |
Formation of embedded magnetic random-access memory devices |
Ashim Dutta, Chih-Chao Yang, Michael Rizzolo, Jon Slaughter |
2020-07-07 |
| 10685879 |
Lithographic alignment of a conductive line to a via |
Ashim Dutta, Dominik Metzler, Takeshi Nogami |
2020-06-16 |
| 10680169 |
Multilayer hardmask for high performance MRAM devices |
Michael Rizzolo, Daniel C. Edelstein, Theodorus E. Standaert, Kisup Chung, Isabel Cristina Chu |
2020-06-09 |
| 10580652 |
Alternating hardmasks for tight-pitch line formation |
Anuja E. DeSilva, Nelson Felix, Chi-Chun Liu, Yann Mignot, Stuart A. Sieg |
2020-03-03 |
| 10559467 |
Selective gas etching for self-aligned pattern transfer |
Sean D. Burns, Yann Mignot, Yongan Xu |
2020-02-11 |
