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Method and structure for forming MRAM device |
Soon-Cheon Seo, Seyoung Kim, Injo Ok, Choonghyun Lee |
2020-08-18 |
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Metal cut patterning and etching to minimize interlayer dielectric layer loss |
Ekmini Anuja De Silva, Andrew M. Greene, Siva Kanakasabapathy, Indira Seshadri |
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Multilayer hardmask for high performance MRAM devices |
Michael Rizzolo, Daniel C. Edelstein, Theodorus E. Standaert, Isabel Cristina Chu, John C. Arnold |
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| 10693059 |
MTJ stack etch using IBE to achieve vertical profile |
Soon-Cheon Seo, Injo Ok, Seyoung Kim, Choonghyun Lee |
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| 10680169 |
Multilayer hardmask for high performance MRAM devices |
Michael Rizzolo, Daniel C. Edelstein, Theodorus E. Standaert, Isabel Cristina Chu, John C. Arnold |
2020-06-09 |
| 10651266 |
Efficient metal-insulator-metal capacitor |
Isabel C. Estrada-Raygoza, Hemanth Jagannathan, Chi-Chun Liu, Yann Mignot, Hao Tang |
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Additive core subtractive liner for metal cut etch processes |
Ruqiang Bao, Andrew M. Greene, Sivananda K. Kanakasabapathy, David L. Rath, Indira Seshadri +1 more |
2020-03-24 |