| 10879068 |
Extreme ultraviolet lithography for high volume manufacture of a semiconductor device |
Yongan Xu, Yann Mignot, John C. Arnold |
2020-12-29 |
| 10833192 |
Substantially defect free relaxed heterogeneous semiconductor fins on bulk substrates |
Veeraraghavan S. Basker, Shogo Mochizuki, Alexander Reznicek |
2020-11-10 |
| 10833150 |
Fast recrystallization of hafnium or zirconium based oxides in insulator-metal structures |
Martin M. Frank, Kam-Leung Lee, Eduard A. Cartier, Vijay Narayanan, Jean Fompeyrine +2 more |
2020-11-10 |
| 10832973 |
Stress modulation of nFET and pFET fin structures |
Huimei Zhou, Kangguo Cheng, Michael P. Belyansky, Richard A. Conti, James J. Kelly +1 more |
2020-11-10 |
| 10804106 |
High temperature ultra-fast annealed soft mask for semiconductor devices |
Mona A. Ebrish, Indira Seshadri, Ekmini Anuja De Silva |
2020-10-13 |
| 10804270 |
Contact formation through low-tempearature epitaxial deposition in semiconductor devices |
Shogo Mochizuki, Hiroaki Niimi, Tenko Yamashita, Chun-Chen Yeh |
2020-10-13 |
| 10784371 |
Self aligned top extension formation for vertical transistors |
Sanjay C. Mehta, Shogo Mochizuki, Alexander Reznicek |
2020-09-22 |
| 10777464 |
Low thermal budget top source and drain region formation for vertical transistors |
Alexander Reznicek, Shogo Mochizuki |
2020-09-15 |
| 10777468 |
Stacked vertical field-effect transistors with sacrificial layer patterning |
Chen Zhang, Tenko Yamashita, Kangguo Cheng |
2020-09-15 |
| 10734518 |
Substantially defect free relaxed heterogeneous semiconductor fins on bulk substrates |
Veeraraghavan S. Basker, Shogo Mochizuki, Alexander Reznicek |
2020-08-04 |
| 10692768 |
Vertical transport field-effect transistor architecture |
Joshua M. Rubin, Chen Zhang, Tenko Yamashita |
2020-06-23 |
| 10692868 |
Contact formation through low-temperature epitaxial deposition in semiconductor devices |
Shogo Mochizuki, Hiroaki Niimi, Tenko Yamashita, Chun-Chen Yeh |
2020-06-23 |
| 10685961 |
Contact formation in semiconductor devices |
Zuoguang Liu, Hiroaki Niimi, Joseph S. Washington, Tenko Yamashita |
2020-06-16 |
| 10665512 |
Stress modulation of nFET and pFET fin structures |
Huimei Zhou, Kangguo Cheng, Michael P. Belyansky, Richard A. Conti, James J. Kelly +1 more |
2020-05-26 |
| 10658180 |
EUV pattern transfer with ion implantation and reduced impact of resist residue |
Yann Mignot, Yongan Xu |
2020-05-19 |
| 10651308 |
Self aligned top extension formation for vertical transistors |
Sanjay C. Mehta, Shogo Mochizuki, Alexander Reznicek |
2020-05-12 |
| 10651089 |
Low thermal budget top source and drain region formation for vertical transistors |
Alexander Reznicek, Shogo Mochizuki |
2020-05-12 |
| 10643006 |
Semiconductor chip including integrated security circuit |
Kangguo Cheng |
2020-05-05 |
| 10622379 |
Structure and method to form defect free high-mobility semiconductor fins on insulator |
Veeraraghavan S. Basker, Shogo Mochizuki, Alexander Reznicek |
2020-04-14 |
| 10586769 |
Contact formation in semiconductor devices |
Jiseok Kim, Zuoguang Liu, Shogo Mochizuki, Hiroaki Niimi |
2020-03-10 |
| 10551742 |
Tunable adhesion of EUV photoresist on oxide surface |
Yongan Xu, Jing Guo, Ekmini Anuja De Silva |
2020-02-04 |
| 10553439 |
Multiple nanosecond laser pulse anneal processes and resultant semiconductor structure |
Aritra Dasgupta |
2020-02-04 |
| 10529828 |
Method of forming vertical transistor having dual bottom spacers |
Sanjay C. Mehta, Shogo Mochizuki, Alexander Reznicek |
2020-01-07 |
