Issued Patents 2020
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10879133 | Replacement metal gate process for CMOS integrated circuits | Seung-Chul Song | 2020-12-29 |
| 10854510 | Titanium silicide formation in a narrow source-drain contact | Min Gyu Sung, Kwanyong LIM | 2020-12-01 |
| 10833019 | Dual metal-insulator-semiconductor contact structure and formulation method | Takashi Ando, Tenko Yamashita | 2020-11-10 |
| 10818599 | Hybrid source and drain contact formation using metal liner and metal insulator semiconductor contacts | Shariq Siddiqui, Tenko Yamashita | 2020-10-27 |
| 10804270 | Contact formation through low-tempearature epitaxial deposition in semiconductor devices | Oleg Gluschenkov, Shogo Mochizuki, Tenko Yamashita, Chun-Chen Yeh | 2020-10-13 |
| 10692868 | Contact formation through low-temperature epitaxial deposition in semiconductor devices | Oleg Gluschenkov, Shogo Mochizuki, Tenko Yamashita, Chun-Chen Yeh | 2020-06-23 |
| 10685961 | Contact formation in semiconductor devices | Oleg Gluschenkov, Zuoguang Liu, Joseph S. Washington, Tenko Yamashita | 2020-06-16 |
| 10643894 | Surface area and Schottky barrier height engineering for contact trench epitaxy | Jody A. Fronheiser, Shogo Mochizuki, Balasubramanian Pranatharthiharan, Mark V. Raymond, Tenko Yamashita | 2020-05-05 |
| 10643893 | Surface area and Schottky barrier height engineering for contact trench epitaxy | Jody A. Fronheiser, Shogo Mochizuki, Balasubramanian Pranatharthiharan, Mark V. Raymond, Tenko Yamashita | 2020-05-05 |
| 10586769 | Contact formation in semiconductor devices | Oleg Gluschenkov, Jiseok Kim, Zuoguang Liu, Shogo Mochizuki | 2020-03-10 |
| 10535606 | Dual metal-insulator-semiconductor contact structure and formulation method | Takashi Ando, Tenko Yamashita | 2020-01-14 |