MS

Min Gyu Sung

VA Varian Semiconductor Equipment Associates: 8 patents #3 of 114Top 3%
Applied Materials: 5 patents #89 of 1,256Top 8%
Globalfoundries: 1 patents #224 of 583Top 40%
IBM: 1 patents #5,490 of 11,274Top 50%
📍 Latham, NY: #1 of 33 inventorsTop 4%
🗺 New York: #154 of 13,306 inventorsTop 2%
Overall (2020): #3,743 of 565,922Top 1%
15
Patents 2020

Issued Patents 2020

Showing 1–15 of 15 patents

Patent #TitleCo-InventorsDate
10854510 Titanium silicide formation in a narrow source-drain contact Kwanyong LIM, Hiroaki Niimi 2020-12-01
10811304 Increased isolation of diffusion breaks in FinFET devices using an angled etch Sony Varghese 2020-10-20
10804156 Techniques for forming dual epitaxial source/drain semiconductor device Rajesh Prasad 2020-10-13
10790395 finFET with improved nitride to fin spacing Injo Ok, Ruilong Xie, Chanro Park 2020-09-29
10755965 Method and device isolation structure in finFET 2020-08-25
10720357 Method of forming transistor device having fin cut regions Naushad K. Variam, Sony Varghese, Johannes M. van Meer, Jae-Young Lee, Jun Seok Lee 2020-07-21
10692775 Fin damage reduction during punch through implantation of FinFET device Jae-Young Lee, Johannes M. van Meer, Sony Varghese, Naushad K. Variam 2020-06-23
10686033 Fin damage reduction during punch through implantation of FinFET device Jae-Young Lee, Johannes M. van Meer, Sony Varghese, Naushad K. Variam 2020-06-16
10685865 Method and device for power rail in a fin type field effect transistor Sony Varghese, Johannes M. van Meer, John Hautala 2020-06-16
10644117 Techniques for contact formation in self-aligned replacement gate device Wenhui Wang, Jun Seok Lee, Sony Varghese 2020-05-05
10629741 Method and device for shallow trench isolation in a fin type field effect transistors Johannes M. van Meer 2020-04-21
10629437 Techniques and structure for forming dynamic random-access device using angled ions Sony Varghese, John Hautala, Steven R. Sherman, Rajesh Prasad 2020-04-21
10607847 Gate all around device and method of formation using angled ions Sony Varghese, Anthony Renau, Morgan Evans, Joseph C. Olson 2020-03-31
10580651 Integration of device regions Sony Varghese 2020-03-03
10546770 Method and device isolation structure in finFET 2020-01-28