Issued Patents 2020
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10840354 | Approach to bottom dielectric isolation for vertical transport fin field effect transistors | Zhenxing Bi, Thamarai S. Devarajan, Balasubramanian Pranatharthiharan, Sanjay C. Mehta | 2020-11-17 |
| 10825720 | Single trench damascene interconnect using TiN HMO | Yann Mignot, Yongan Xu | 2020-11-03 |
| 10755963 | Crossbar reinforced semiconductor fins having reduced wiggling | Kangguo Cheng, Chi-Chun Liu, Yann Mignot | 2020-08-25 |
| 10734245 | Highly selective dry etch process for vertical FET STI recess | Zhenxing Bi, Richard A. Conti, Michael P. Belyansky | 2020-08-04 |
| 10707132 | Method to recess cobalt for gate metal application | Georges Jacobi, Vimal Kamineni, Randolph F. Knarr, Balasubramanian Pranatharthiharan | 2020-07-07 |
| 10707326 | Vertical field-effect-transistors having a silicon oxide layer with controlled thickness | Chi-Chun Liu, Sanjay C. Mehta, Luciana Meli, Kristin Schmidt, Ankit Vora | 2020-07-07 |
| 10692985 | Protection of high-K dielectric during reliability anneal on nanosheet structures | Nicolas Loubet, Sanjay C. Mehta, Vijay Narayanan | 2020-06-23 |
| 10680081 | Vertical transistors with improved top source/drain junctions | Kangguo Cheng, Ruilong Xie, Tenko Yamashita, Chun-Chen Yeh | 2020-06-09 |
| 10658521 | Enabling residue free gap fill between nanosheets | Indira Seshadri, Ekmini Anuja De Silva, Jing Guo, Ruqiang Bao, Nelson Felix | 2020-05-19 |
| 10629702 | Approach to bottom dielectric isolation for vertical transport fin field effect transistors | Zhenxing Bi, Thamarai S. Devarajan, Balasubramanian Pranatharthiharan, Sanjay C. Mehta | 2020-04-21 |
| 10615078 | Method to recess cobalt for gate metal application | Georges Jacobi, Vimal Kamineni, Randolph F. Knarr, Balasubramanian Pranatharthiharan | 2020-04-07 |
| 10607922 | Controlling via critical dimension during fabrication of a semiconductor wafer | Yann Mignot, Yongan Xu | 2020-03-31 |
| 10546785 | Method to recess cobalt for gate metal application | Georges Jacobi, Vimal Kamineni, Randolph F. Knarr, Balasubramanian Pranatharthiharan | 2020-01-28 |