Issued Patents 2002
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6500357 | System level in-situ integrated dielectric etch process particularly useful for copper dual damascene | Lee Luo, Claes Bjorkman, Brian Sy-Yuan Shieh | 2002-12-31 |
| 6488862 | Etched patterned copper features free from etch process residue | Yan Ye, Diana Xiaobing Ma | 2002-12-03 |
| 6488807 | Magnetic confinement in a plasma reactor having an RF bias electrode | Kenneth S. Collins, Chan-Lon Yang, Jerry Wong, Jeffrey Marks, Peter Keswick +7 more | 2002-12-03 |
| 6475335 | RF plasma reactor with hybrid conductor and multi-radius dome ceiling | Diana Xiabing Ma, Peter Loewenhardt, Philip M. Salzman, Allen Zhao, Hiroji Hanawa | 2002-11-05 |
| 6471822 | Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma | Peter Loewenhardt, Arnold Kholodenko, Hong Chin Shan, Chii Guang Lee, Dan Katz | 2002-10-29 |
| 6454898 | Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners | Kenneth S. Collins, Michael R. Rice, Douglas A. Buchberger, Jr., Craig A. Roderick, Eric Askarinam +5 more | 2002-09-24 |
| 6440866 | Plasma reactor with heated source of a polymer-hardening precursor material | Kenneth S. Collins, Michael R. Rice, David W. Groechel, Jon Mohn, Craig A. Roderick +5 more | 2002-08-27 |
| 6402885 | Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma | Peter Loewenhardt, Philip M. Salzman | 2002-06-11 |
| 6387287 | Process for etching oxide using a hexafluorobutadiene and manifesting a wide process window | Hoiman Hung, Joseph P. Caulfield, Hongqing Shan, Ruiping Wang | 2002-05-14 |
| 6379575 | Treatment of etching chambers using activated cleaning gas | Xue-Yu Qian, Patrick Leahey, Jonathan D. Mohn, Waiching Chow, Arthur Y. Chen +2 more | 2002-04-30 |
| 6361705 | Plasma process for selectively etching oxide using fluoropropane or fluoropropylene | Ruiping Wang, Hao Lu, Robert Wu, Jian Ding | 2002-03-26 |
| 6352049 | Plasma assisted processing chamber with separate control of species density | Arnold Kolandenko, Hong Ching Shan, Peter Loewenhardt, Chii Guang Lee, Yan Ye +9 more | 2002-03-05 |
| 6340435 | Integrated low K dielectrics and etch stops | Claes Bjorkman, Min Melissa Yu, Hongquing Shan, David Cheung, Wai-Fan Yau +7 more | 2002-01-22 |