Issued Patents 2002
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6475335 | RF plasma reactor with hybrid conductor and multi-radius dome ceiling | Gerald Yin, Diana Xiabing Ma, Philip M. Salzman, Allen Zhao, Hiroji Hanawa | 2002-11-05 |
| 6471822 | Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma | Gerald Yin, Arnold Kholodenko, Hong Chin Shan, Chii Guang Lee, Dan Katz | 2002-10-29 |
| 6449871 | Semiconductor process chamber having improved gas distributor | Arnold Kholodenko, Dmitry Lubomirsky, Guang-Jye Shiau, Shamouil Shamouilian | 2002-09-17 |
| 6418874 | Toroidal plasma source for plasma processing | Michael S. Cox, Canfeng Lai, Robert B. Majewski, David Wanamaker, Christopher T. Lane +2 more | 2002-07-16 |
| 6402885 | Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma | Gerald Yin, Philip M. Salzman | 2002-06-11 |
| 6356097 | Capacitive probe for in situ measurement of wafer DC bias voltage | Arthur H. Sato, Valentin Todorov | 2002-03-12 |
| 6352049 | Plasma assisted processing chamber with separate control of species density | Gerald Yin, Arnold Kolandenko, Hong Ching Shan, Chii Guang Lee, Yan Ye +9 more | 2002-03-05 |