Issued Patents 2002
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6472822 | Pulsed RF power delivery for plasma processing | Jin-Yuan Chen, John Holland, Valentin N. Todorow | 2002-10-29 |
| 6447637 | Process chamber having a voltage distribution electrode | Valentin Todorov, Robert E. Ryan, Jin-Yuan Chen, Xueyu Qian, Zhiwen Sun | 2002-09-10 |
| 6447636 | Plasma reactor with dynamic RF inductive and capacitive coupling control | Xue-Yu Qian, Zhi-Wen Sun, Maocheng Li, John Holland, Valentin Todorov +2 more | 2002-09-10 |
| 6401652 | Plasma reactor inductive coil antenna with flat surface facing the plasma | Jonathan D. Mohn, Kien N. Chuc | 2002-06-11 |
| 6373022 | Plasma reactor with antenna of coil conductors of concentric helices offset along the axis of symmetry | Xue-Yu Qian | 2002-04-16 |
| 6369349 | Plasma reactor with coil antenna of interleaved conductors | Xue-Yu Qian | 2002-04-09 |
| 6369348 | Plasma reactor with coil antenna of plural helical conductors with equally spaced ends | Xue-Yu Qian | 2002-04-09 |
| 6356097 | Capacitive probe for in situ measurement of wafer DC bias voltage | Peter Loewenhardt, Valentin Todorov | 2002-03-12 |
| 6352049 | Plasma assisted processing chamber with separate control of species density | Gerald Yin, Arnold Kolandenko, Hong Ching Shan, Peter Loewenhardt, Chii Guang Lee +9 more | 2002-03-05 |