Issued Patents 2002
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6447636 | Plasma reactor with dynamic RF inductive and capacitive coupling control | Xue-Yu Qian, Zhi-Wen Sun, Maocheng Li, John Holland, Arthur H. Sato +2 more | 2002-09-10 |
| 6447637 | Process chamber having a voltage distribution electrode | Robert E. Ryan, Arthur H. Sato, Jin-Yuan Chen, Xueyu Qian, Zhiwen Sun | 2002-09-10 |
| 6399507 | Stable plasma process for etching of films | Padmapani Nallan, John Holland, Thorsten Lill | 2002-06-04 |
| 6356097 | Capacitive probe for in situ measurement of wafer DC bias voltage | Peter Loewenhardt, Arthur H. Sato | 2002-03-12 |