Issued Patents 2002
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6447636 | Plasma reactor with dynamic RF inductive and capacitive coupling control | Zhi-Wen Sun, Maocheng Li, John Holland, Arthur H. Sato, Valentin Todorov +2 more | 2002-09-10 |
| 6390019 | Chamber having improved process monitoring window | Michael N. Grimbergen | 2002-05-21 |
| 6379575 | Treatment of etching chambers using activated cleaning gas | Gerald Yin, Patrick Leahey, Jonathan D. Mohn, Waiching Chow, Arthur Y. Chen +2 more | 2002-04-30 |
| 6373022 | Plasma reactor with antenna of coil conductors of concentric helices offset along the axis of symmetry | Arthur H. Sato | 2002-04-16 |
| 6369348 | Plasma reactor with coil antenna of plural helical conductors with equally spaced ends | Arthur H. Sato | 2002-04-09 |
| 6369349 | Plasma reactor with coil antenna of interleaved conductors | Arthur H. Sato | 2002-04-09 |