Issued Patents 2002
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6489247 | Copper etch using HCl and HBR chemistry | Yan Ye, Xiancan Deng, Diana Xiaobing Ma | 2002-12-03 |
| 6475335 | RF plasma reactor with hybrid conductor and multi-radius dome ceiling | Gerald Yin, Diana Xiabing Ma, Peter Loewenhardt, Philip M. Salzman, Hiroji Hanawa | 2002-11-05 |
| 6458516 | Method of etching dielectric layers using a removable hardmask | Yan Ye, Pavel Ionov, Peter Hsieh, Diana Xiaobing Ma, Chun Yan +1 more | 2002-10-01 |
| 6352081 | Method of cleaning a semiconductor device processing chamber after a copper etch process | Danny Lu, Peter Hsieh, Hong Shih, Li Xu, Yan Ye | 2002-03-05 |