Issued Patents 2002
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6494986 | Externally excited multiple torroidal plasma source | Hiroji Hanawa, Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2002-12-17 |
| 6489247 | Copper etch using HCl and HBR chemistry | Allen Zhao, Xiancan Deng, Diana Xiaobing Ma | 2002-12-03 |
| 6488862 | Etched patterned copper features free from etch process residue | Diana Xiaobing Ma, Gerald Yin | 2002-12-03 |
| 6468388 | Reactor chamber for an externally excited torroidal plasma source with a gas distribution plate | Hiroji Hanawa, Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2002-10-22 |
| 6458516 | Method of etching dielectric layers using a removable hardmask | Pavel Ionov, Allen Zhao, Peter Hsieh, Diana Xiaobing Ma, Chun Yan +1 more | 2002-10-01 |
| 6455431 | NH3 plasma descumming and resist stripping in semiconductor applications | Chang-Lin Hsieh, Hui Chen, Jie Yuan | 2002-09-24 |
| 6453842 | Externally excited torroidal plasma source using a gas distribution plate | Hiroji Hanawa, Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2002-09-24 |
| 6410449 | Method of processing a workpiece using an externally excited torroidal plasma source | Hiroji Hanawa, Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2002-06-25 |
| 6372633 | Method and apparatus for forming metal interconnects | Dan Maydan, Ashok Sinha, Zheng Xu, Liang Chen, Roderick C. Mosely +3 more | 2002-04-16 |
| 6352081 | Method of cleaning a semiconductor device processing chamber after a copper etch process | Danny Lu, Allen Zhao, Peter Hsieh, Hong Shih, Li Xu | 2002-03-05 |
| 6352049 | Plasma assisted processing chamber with separate control of species density | Gerald Yin, Arnold Kolandenko, Hong Ching Shan, Peter Loewenhardt, Chii Guang Lee +9 more | 2002-03-05 |
| 6348126 | Externally excited torroidal plasma source | Hiroji Hanawa, Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2002-02-19 |