Issued Patents 2002
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6494986 | Externally excited multiple torroidal plasma source | Hiroji Hanawa, Yan Ye, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2002-12-17 |
| 6488807 | Magnetic confinement in a plasma reactor having an RF bias electrode | Chan-Lon Yang, Jerry Wong, Jeffrey Marks, Peter Keswick, David W. Groechel +7 more | 2002-12-03 |
| 6468388 | Reactor chamber for an externally excited torroidal plasma source with a gas distribution plate | Hiroji Hanawa, Yan Ye, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2002-10-22 |
| 6453842 | Externally excited torroidal plasma source using a gas distribution plate | Hiroji Hanawa, Yan Ye, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2002-09-24 |
| 6454898 | Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners | Michael R. Rice, Douglas A. Buchberger, Jr., Craig A. Roderick, Eric Askarinam, Gerhard Schneider +5 more | 2002-09-24 |
| 6444084 | Low density high frequency process for a parallel-plate electrode plasma reactor having an inductive antenna | — | 2002-09-03 |
| 6444085 | Inductively coupled RF plasma reactor having an antenna adjacent a window electrode | Michael R. Rice, John Trow, Douglas A. Buchberger, Jr., Craig A. Roderick | 2002-09-03 |
| 6444137 | Method for processing substrates using gaseous silicon scavenger | Chan-Lon Yang, Jerry Wong, Jeffrey Marks, Peter Keswick, David W. Groechel | 2002-09-03 |
| 6440221 | Process chamber having improved temperature control | Shamouil Shamouilian, Ananda H. Kumar, Kadthala Ramaya Narendrnath, Eric Askarinam, Edwin C. Weldon +1 more | 2002-08-27 |
| 6440866 | Plasma reactor with heated source of a polymer-hardening precursor material | Michael R. Rice, David W. Groechel, Gerald Yin, Jon Mohn, Craig A. Roderick +5 more | 2002-08-27 |
| 6414834 | Dielectric covered electrostatic chuck | Edwin C. Weldon, Arik Donde, Brian Lue, Dan Maydan, Robert Steger +8 more | 2002-07-02 |
| 6410449 | Method of processing a workpiece using an externally excited torroidal plasma source | Hiroji Hanawa, Yan Ye, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2002-06-25 |
| 6365063 | Plasma reactor having a dual mode RF power application | Michael R. Rice, Farahmand Askarinam, Douglas A. Buchberger, Jr., Craig A. Roderick | 2002-04-02 |
| 6361644 | Parallel-plate electrode reactor having an inductive antenna coupling power through a parallel plate electrode | — | 2002-03-26 |
| 6348126 | Externally excited torroidal plasma source | Hiroji Hanawa, Yan Ye, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2002-02-19 |