Issued Patents 2002
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6488807 | Magnetic confinement in a plasma reactor having an RF bias electrode | Kenneth S. Collins, Chan-Lon Yang, Jerry Wong, Peter Keswick, David W. Groechel +7 more | 2002-12-03 |
| 6444137 | Method for processing substrates using gaseous silicon scavenger | Kenneth S. Collins, Chan-Lon Yang, Jerry Wong, Peter Keswick, David W. Groechel | 2002-09-03 |
| 6440866 | Plasma reactor with heated source of a polymer-hardening precursor material | Kenneth S. Collins, Michael R. Rice, David W. Groechel, Gerald Yin, Jon Mohn +5 more | 2002-08-27 |
| 6399514 | High temperature silicon surface providing high selectivity in an oxide etch process | Jerry Wong, David W. Groechel, Peter Keswick, Chan-Lon Yang | 2002-06-04 |
| 6362110 | Enhanced resist strip in a dielectric etcher using downstream plasma | — | 2002-03-26 |