Issued Patents 2002
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6488807 | Magnetic confinement in a plasma reactor having an RF bias electrode | Kenneth S. Collins, Chan-Lon Yang, Jeffrey Marks, Peter Keswick, David W. Groechel +7 more | 2002-12-03 |
| 6444137 | Method for processing substrates using gaseous silicon scavenger | Kenneth S. Collins, Chan-Lon Yang, Jeffrey Marks, Peter Keswick, David W. Groechel | 2002-09-03 |
| 6399514 | High temperature silicon surface providing high selectivity in an oxide etch process | Jeffrey Marks, David W. Groechel, Peter Keswick, Chan-Lon Yang | 2002-06-04 |
| 6352937 | Method for stripping organic based film | Shingo Kadomura, Masato Toshima | 2002-03-05 |