Issued Patents 2002
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6494958 | Plasma chamber support with coupled electrode | Jon McChesney, Kwok Manus Wong, Liang Wang, Alexander Veytser, Dennis S. Grimard | 2002-12-17 |
| 6490146 | Electrostatic chuck bonded to base with a bond layer and method | You Wang, Arnold Kholodenko, Alexander Veytser, Surinder Bedi, Kadthala Ramaya Narendrnath +4 more | 2002-12-03 |
| 6490144 | Support for supporting a substrate in a process chamber | Kadthala Ramaya Narendrnath, Syed H. Askari, Dennis S. Grimard, Surinder Bedi, Ananda H. Kumar | 2002-12-03 |
| 6481886 | Apparatus for measuring pedestal and substrate temperature in a semiconductor wafer processing system | Kadthala Ramaya Narendrnath, Liang Wang, Paul Luscher, Hamid Noorbakhsh | 2002-11-19 |
| 6478924 | Plasma chamber support having dual electrodes | Arnold Kholodenko, Kwok Manus Wong, Liang Wang, Alexander Veytser, Dennis S. Grimard | 2002-11-12 |
| 6468490 | Abatement of fluorine gas from effluent | Mehran Moalem, Tony Kaushal | 2002-10-22 |
| 6462928 | Electrostatic chuck having improved electrical connector and method | You Wang, Surinder Bedi, Arnold Kholodenko, Alexander Veytser, Kadthala Ramaya Narendrnath +4 more | 2002-10-08 |
| 6449871 | Semiconductor process chamber having improved gas distributor | Arnold Kholodenko, Dmitry Lubomirsky, Guang-Jye Shiau, Peter Loewenhardt | 2002-09-17 |
| 6440221 | Process chamber having improved temperature control | Ananda H. Kumar, Kadthala Ramaya Narendrnath, Eric Askarinam, Edwin C. Weldon, Michael R. Rice +1 more | 2002-08-27 |
| 6432282 | Method and apparatus for supplying electricity uniformly to a workpiece | Anada H. Kumar, Donald Olgado, Joseph Stevens, Ricardo Leon, Jon Clinton | 2002-08-13 |
| 6418874 | Toroidal plasma source for plasma processing | Michael S. Cox, Canfeng Lai, Robert B. Majewski, David Wanamaker, Christopher T. Lane +2 more | 2002-07-16 |
| 6414834 | Dielectric covered electrostatic chuck | Edwin C. Weldon, Kenneth S. Collins, Arik Donde, Brian Lue, Dan Maydan +8 more | 2002-07-02 |
| 6391146 | Erosion resistant gas energizer | Ashish Bhatnagar, Kartik Ramaswamy, Tony Kaushal, Kwok Manus Wong | 2002-05-21 |
| 6367412 | Porous ceramic liner for a plasma source | Kartik Ramaswamy, Kwok Manus Wong, Ashish Bhatnagar, Mehran Moalem, Tony Kaushal | 2002-04-09 |
| 6370006 | Electrostatic chuck having a plurality of gas inlet channels | Ananda H. Kumar, Kadthala Ramaya Narendrnath | 2002-04-09 |