Issued Patents 2002
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6494958 | Plasma chamber support with coupled electrode | Shamouil Shamouilian, Jon McChesney, Kwok Manus Wong, Liang Wang, Alexander Veytser | 2002-12-17 |
| 6490144 | Support for supporting a substrate in a process chamber | Kadthala Ramaya Narendrnath, Syed H. Askari, Surinder Bedi, Ananda H. Kumar, Shamouil Shamouilian | 2002-12-03 |
| 6490146 | Electrostatic chuck bonded to base with a bond layer and method | You Wang, Shamouil Shamouilian, Arnold Kholodenko, Alexander Veytser, Surinder Bedi +4 more | 2002-12-03 |
| 6478924 | Plasma chamber support having dual electrodes | Shamouil Shamouilian, Arnold Kholodenko, Kwok Manus Wong, Liang Wang, Alexander Veytser | 2002-11-12 |
| 6462928 | Electrostatic chuck having improved electrical connector and method | Shamouil Shamouilian, You Wang, Surinder Bedi, Arnold Kholodenko, Alexander Veytser +4 more | 2002-10-08 |
| 6454898 | Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners | Kenneth S. Collins, Michael R. Rice, Douglas A. Buchberger, Jr., Craig A. Roderick, Eric Askarinam +5 more | 2002-09-24 |
| 6414834 | Dielectric covered electrostatic chuck | Edwin C. Weldon, Kenneth S. Collins, Arik Donde, Brian Lue, Dan Maydan +8 more | 2002-07-02 |