Issued Patents 2002
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6454898 | Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners | Kenneth S. Collins, Michael R. Rice, Douglas A. Buchberger, Jr., Craig A. Roderick, Eric Askarinam +5 more | 2002-09-24 |
| 6432318 | Dielectric etch process reducing striations and maintaining critical dimensions | Ji Ding, Hidehiro Kojiri, Yoshio Ishikawa, Keiji Horioka, Ruiping Wang +1 more | 2002-08-13 |
| 6379574 | Integrated post-etch treatment for a dielectric etch process | Hui Ou-Yang, Chih-Ping Yang, Lin-Xiu Ye, Chih-Pang Chen, You-Neng Cheng +2 more | 2002-04-30 |
| 6361705 | Plasma process for selectively etching oxide using fluoropropane or fluoropropylene | Ruiping Wang, Gerald Yin, Hao Lu, Jian Ding | 2002-03-26 |