Issued Patents 2002
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6489248 | Method and apparatus for etch passivating and etching a substrate | Luke Zhang, Ida Ariani Adisaputro, Kwang Soo Kim | 2002-12-03 |
| 6432318 | Dielectric etch process reducing striations and maintaining critical dimensions | Ji Ding, Hidehiro Kojiri, Yoshio Ishikawa, Keiji Horioka, Robert Wu +1 more | 2002-08-13 |
| 6403491 | Etch method using a dielectric etch chamber with expanded process window | Jingbao Liu, Judy Wang, Takehiko Komatsu, Bryan Pu, Kenny L. Doan +4 more | 2002-06-11 |
| 6387287 | Process for etching oxide using a hexafluorobutadiene and manifesting a wide process window | Hoiman Hung, Joseph P. Caulfield, Hongqing Shan, Gerald Yin | 2002-05-14 |
| 6361705 | Plasma process for selectively etching oxide using fluoropropane or fluoropropylene | Gerald Yin, Hao Lu, Robert Wu, Jian Ding | 2002-03-26 |