Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6432318 | Dielectric etch process reducing striations and maintaining critical dimensions | Ji Ding, Hidehiro Kojiri, Yoshio Ishikawa, Keiji Horioka, Ruiping Wang +1 more | 2002-08-13 |
| 6387287 | Process for etching oxide using a hexafluorobutadiene and manifesting a wide process window | Joseph P. Caulfield, Hongqing Shan, Ruiping Wang, Gerald Yin | 2002-05-14 |
| 6380096 | In-situ integrated oxide etch process particularly useful for copper dual damascene | Joseph P. Caulfield, Sum-Yee Betty Tang, Jian Ding, Tianzong Xu | 2002-04-30 |