Issued Patents 2002
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6451703 | Magnetically enhanced plasma etch process using a heavy fluorocarbon etching gas | Jingbao Liu, Takehiko Komatsu, Keji Horioka, Bryan Pu | 2002-09-17 |
| 6440864 | Substrate cleaning process | Thomas J. Kropewnicki, Jeremiah T. Pender, Henry Fong, Charles Peter Auglis, Raymond Hung | 2002-08-27 |
| 6387287 | Process for etching oxide using a hexafluorobutadiene and manifesting a wide process window | Hoiman Hung, Joseph P. Caulfield, Ruiping Wang, Gerald Yin | 2002-05-14 |
| 6362109 | Oxide/nitride etching having high selectivity to photoresist | Yungsang Kim, Takehiko Komatsu, Claes Bjorkman | 2002-03-26 |