Issued Patents 2002
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6500357 | System level in-situ integrated dielectric etch process particularly useful for copper dual damascene | Lee Luo, Brian Sy-Yuan Shieh, Gerald Yin | 2002-12-31 |
| 6403491 | Etch method using a dielectric etch chamber with expanded process window | Jingbao Liu, Judy Wang, Takehiko Komatsu, Bryan Pu, Kenny L. Doan +4 more | 2002-06-11 |
| 6387288 | High selectivity etch using an external plasma discharge | Hongching Shan, Michael Welch | 2002-05-14 |
| 6362109 | Oxide/nitride etching having high selectivity to photoresist | Yungsang Kim, Takehiko Komatsu, Hongqing Shan | 2002-03-26 |
| 6340435 | Integrated low K dielectrics and etch stops | Min Melissa Yu, Hongquing Shan, David Cheung, Wai-Fan Yau, Kuowei Liu +7 more | 2002-01-22 |