Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6451703 | Magnetically enhanced plasma etch process using a heavy fluorocarbon etching gas | Jingbao Liu, Hongqing Shan, Keji Horioka, Bryan Pu | 2002-09-17 |
| 6403491 | Etch method using a dielectric etch chamber with expanded process window | Jingbao Liu, Judy Wang, Bryan Pu, Kenny L. Doan, Claes Bjorkman +4 more | 2002-06-11 |
| 6362109 | Oxide/nitride etching having high selectivity to photoresist | Yungsang Kim, Claes Bjorkman, Hongqing Shan | 2002-03-26 |