Issued Patents 2002
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6461533 | Etchant for silicon oxide and method | Yasuhiro Horiike, Yoshio Ishikawa | 2002-10-08 |
| 6432318 | Dielectric etch process reducing striations and maintaining critical dimensions | Ji Ding, Hidehiro Kojiri, Yoshio Ishikawa, Ruiping Wang, Robert Wu +1 more | 2002-08-13 |