Issued Patents All Time
Showing 126–150 of 150 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10678138 | Extreme ultraviolet (EUV) radiation source and a method for generating extreme ultraviolet radiation | Wei-Chun Yen, Chi-Ming Yang, Shang-Chieh Chien, Li-Jui Chen | 2020-06-09 |
| 10670970 | Lithography system and method thereof | Wei-Shin Cheng, Hsin-Feng Chen, Cheng-Hao LAI, Shao-Hua Wang, Han-Lung Chang +1 more | 2020-06-02 |
| 10663871 | Reticle stage and method for using the same | Chia-Yu Lee, Tao Chen, Chia-Hao Hsu, Ching-Juinn Huang | 2020-05-26 |
| 10663633 | Aperture design and methods thereof | Hung-Chih Hsieh, Kai-Chiang Wu, Yen-Liang Chen, Kai-Hsiung Chen, Chih-Ming Ke | 2020-05-26 |
| 10656539 | Radiation source for lithography process | Shang-Ying WU, Shang-Chieh Chien, Bo-Tsun Liu, Li-Jui Chen | 2020-05-19 |
| 10642158 | Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen +1 more | 2020-05-05 |
| 10631392 | EUV collector contamination prevention | Ming-Fa Wu, Tzung-Chi Fu, Chun Che Lin, Huai-Tei Yang | 2020-04-21 |
| 10624196 | Laser source device and extreme ultraviolet lithography device | Henry Yee Shian Tong, Wen-Chih Wang, Hsin-Liang Chen, Louis Chun-Lin Chang, Cheng-Chieh Chen +2 more | 2020-04-14 |
| 10534279 | Methods and apparatus for removing contamination from lithographic tool | Zi-Wen Chen, Chih-Tsung Shih, Li-Jui Chen, Shih-Chang Shih | 2020-01-14 |
| 10524345 | Residual gain monitoring and reduction for EUV drive laser | Chun-Lin Chang, Jen-Hao Yeh, Han-Lung Chang, Tzung-Chi Fu, Bo-Tsun Liu +1 more | 2019-12-31 |
| 10512147 | Extreme ultraviolet radiation source and droplet catcher thereof | Chi-Ming Yang, Sheng-Ta Lin, Ssu-Yu Chen, Shang-Chieh Chien, Li-Jui Chen | 2019-12-17 |
| 10509334 | Methods and apparatus for removing contamination from lithographic tool | Zi-Wen Chen, Chih-Tsung Shih, Li-Jui Chen, Shih-Chang Shih | 2019-12-17 |
| 10506698 | EUV source generation method and related system | Chun-Lin Chang, Tzung-Chi Fu, Bo-Tsun Liu, Li-Jui Chen, Wei YI +1 more | 2019-12-10 |
| 10495987 | Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system | Chi-Ming Yang, Ssu-Yu Chen, Shang-Chieh Chien, Chieh Hsieh, Tzung-Chi Fu +2 more | 2019-12-03 |
| 10477663 | Light source for lithography exposure process | Chieh Hsieh, Shang-Chieh Chien, Chun-Chia Hsu, Bo-Tsun Liu, Tzung-Chi Fu +1 more | 2019-11-12 |
| 10461037 | Method for forming semiconductor device structure with overlay grating | Long Chen, Jia-Hong Chu, Chi-Wen Lai, Chia-Ching Liang, Kai-Hsiung Chen +4 more | 2019-10-29 |
| 10429729 | EUV radiation modification methods and systems | Chun-Lin Chang, Jen-Hao Yeh, Tzung-Chi Fu, Bo-Tsun Liu, Li-Jui Chen | 2019-10-01 |
| 10429314 | EUV vessel inspection method and related system | Chun-Lin Chang, Shang-Chieh Chien, Shang-Ying WU, Li-Kai Cheng, Tzung-Chi Fu +4 more | 2019-10-01 |
| 10366973 | Layout modification method for exposure manufacturing process | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen +1 more | 2019-07-30 |
| 10342109 | Apparatus and method for generating extreme ultraviolet radiation | Wei-Chih Lai, Han-Lung Chang, Bo-Tsun Liu, Li-Jui Chen | 2019-07-02 |
| 10314154 | System and method for extreme ultraviolet source control | Chun-Chia Hsu, Chieh Hsieh, Shang-Chieh Chien, Li-Jui Chen, Tzung-Chi Fu +1 more | 2019-06-04 |
| 10274844 | Lithography apparatus and method for protecting a reticle | Jen-Yang Chung, Chieh Hsieh, Shang-Chieh Chien, Li-Jui Chen | 2019-04-30 |
| 10204867 | Semiconductor metrology target and manufacturing method thereof | Long Chen, Jia-Hong Chu, Hsin-Chin LIN, Hsiang-Yu SU, Yun-Heng Tseng +4 more | 2019-02-12 |
| 10162277 | Extreme ultraviolet lithography system with debris trapper on exhaust line | Shang-Chieh Chien, Jye-Fu Jeng, Shih-Chang Shih, Kun-Jin Wu, Guan-Heng Liu +2 more | 2018-12-25 |
| 8778602 | Single photoresist approach for high challenge photo process | Hung-Ting Pan, Jing-Huan Chen, Wei-Chung Ma, Hsin-Chun Chiang, Szu-An Wu | 2014-07-15 |