Issued Patents All Time
Showing 1–25 of 75 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12394624 | Silicon intermixing layer for blocking diffusion | Chun-Chieh Wang, Yueh-Ching Pai, Kuo-Jung Huang | 2025-08-19 |
| 12371780 | Vacuum systems in semiconductor fabrication facilities | Ming-Fa Wu, Wen-Lung Ho | 2025-07-29 |
| 12170202 | Formation and in-situ etching processes for metal layers | Po-Yu Lin, Chi-Yu Chou, Hsien-Ming Lee, Chun-Chieh Wang, Yueh-Ching Pai +3 more | 2024-12-17 |
| 12080761 | Fully strained channel | Shahaji B. More, Zheng-Yang Pan, Shih-Chieh Chang, Chun-Chieh Wang, Cheng-Han Lee | 2024-09-03 |
| 12080582 | Etching apparatus and methods of cleaning thereof | Yu-Chi Lin, Lun-Kuang Tan, Wei-Jen Lo, Chih-Teng Liao | 2024-09-03 |
| 12021143 | P-type strained channel in a fin field effect transistor (FinFET) device | Shahaji B. More, Shih-Chieh Chang, Shu Kuan, Cheng-Han Lee | 2024-06-25 |
| 12021142 | Method of forming source/drain epitaxial stacks | Shahaji B. More, Shih-Chieh Chang, Cheng-Han Lee | 2024-06-25 |
| 12015055 | Doping for semiconductor device with conductive feature | Su-Hao Liu, Huicheng Chang, Chia-Cheng Chen, Liang-Yin Chen, Kuo-Ju Chen +4 more | 2024-06-18 |
| 11990550 | Semiconductor structure with source/drain multi-layer structure and method for forming the same | Chun-Chieh Wang, Yu-Ting Lin, Yueh-Ching Pai, Shih-Chieh Chang | 2024-05-21 |
| 11973127 | Semiconductor structure with source/drain structure having modified shape | Shahaji B. More, Shih-Chieh Chang, Cheng-Han Lee | 2024-04-30 |
| 11854811 | FinFET device and method of forming | Yi-Min Huang, Shih-Chieh Chang | 2023-12-26 |
| 11817499 | P-type strained channel in a fin field effect transistor (FinFET) device | Shahaji B. More, Shih-Chieh Chang, Shu Kuan, Cheng-Han Lee | 2023-11-14 |
| 11742386 | Doping for semiconductor device with conductive feature | Su-Hao Liu, Huicheng Chang, Chia-Cheng Chen, Liang-Yin Chen, Kuo-Ju Chen +4 more | 2023-08-29 |
| 11685015 | Method and system for performing chemical mechanical polishing | Chih-Yuan Yang, Yu-Chen Wei, Szu-Cheng Wang, Li-Hsiang Chao, Jen-Chieh LAI +1 more | 2023-06-27 |
| 11587791 | Silicon intermixing layer for blocking diffusion | Chun-Chieh Wang, Kuo-Jung Huang, Yueh-Ching Pai | 2023-02-21 |
| 11569383 | Method of forming source/drain epitaxial stacks | Shahaji B. More, Shih-Chieh Chang, Cheng-Han Lee | 2023-01-31 |
| 11545363 | Formation and in-situ etching processes for metal layers | Po-Yu Lin, Chi-Yu Chou, Hsien-Ming Lee, Chun-Chieh Wang, Yueh-Ching Pai +3 more | 2023-01-03 |
| 11526073 | Pellicle and method of manufacturing same | Po Hsuan Li, Yu-Ting Lin, Yun-Yue Lin | 2022-12-13 |
| 11527655 | Semiconductor structure with source/drain multi-layer structure and method for forming the same | Chun-Chieh Wang, Yu-Ting Lin, Yueh-Ching Pai, Shih-Chieh Chang | 2022-12-13 |
| 11525185 | Vacuum systems in semiconductor fabrication facilities | Ming-Fa Wu, Wen-Lung Ho | 2022-12-13 |
| 11450741 | Doping for semiconductor device with conductive feature | Su-Hao Liu, Huicheng Chang, Chia-Cheng Chen, Liang-Yin Chen, Kuo-Ju Chen +4 more | 2022-09-20 |
| 11404574 | P-type strained channel in a fin field effect transistor (FinFET) device | Shahaji B. More, Shih-Chieh Chang, Shu Kuan, Cheng-Han Lee | 2022-08-02 |
| 11398482 | Semiconductor device and method | Chun-Chieh Wang, Yueh-Ching Pai | 2022-07-26 |
| 11340525 | Pellicle and method of manufacturing same | Po Hsuan Li, Yu-Ting Lin, Yun-Yue Lin | 2022-05-24 |
| 11233123 | Fully strained channel | Shahaji B. More, Zheng-Yang Pan, Shih-Chieh Chang, Chun-Chieh Wang, Cheng-Han Lee | 2022-01-25 |