Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12276923 | Exhaust system with U-shaped pipes | Yu-Fu Lin, Chia-Chen Chen | 2025-04-15 |
| 11994809 | Exhaust system with u-shaped pipes | Yu-Fu Lin, Chia-Chen Chen | 2024-05-28 |
| 11809075 | EUV lithography mask with a porous reflective multilayer structure | Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng | 2023-11-07 |
| 11681232 | Exhaust system with u-shaped pipes | Yu-Fu Lin, Chia-Chen Chen | 2023-06-20 |
| 11657492 | Reticle backside inspection method | Zi-Wen Chen, Po-Chung Cheng, Chih-Tsung Shih, Li-Jui Chen | 2023-05-23 |
| 11086209 | EUV lithography mask with a porous reflective multilayer structure | Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng | 2021-08-10 |
| 10997706 | Reticle backside inspection method | Zi-Wen Chen, Po-Chung Cheng, Chih-Tsung Shih, Li-Jui Chen | 2021-05-04 |
| 10983447 | Exhaust system with u-shaped pipes | Yu-Fu Lin, Chia-Chen Chen | 2021-04-20 |
| 10852649 | Methods and apparatus for removing contamination from lithographic tool | Zi-Wen Chen, Po-Chung Cheng, Chih-Tsung Shih, Li-Jui Chen | 2020-12-01 |
| 10534279 | Methods and apparatus for removing contamination from lithographic tool | Zi-Wen Chen, Po-Chung Cheng, Chih-Tsung Shih, Li-Jui Chen | 2020-01-14 |
| 10509334 | Methods and apparatus for removing contamination from lithographic tool | Zi-Wen Chen, Po-Chung Cheng, Chih-Tsung Shih, Li-Jui Chen | 2019-12-17 |
| 10162277 | Extreme ultraviolet lithography system with debris trapper on exhaust line | Shang-Chieh Chien, Jye-Fu Jeng, Kun-Jin Wu, Guan-Heng Liu, Jen-Yang Chung +2 more | 2018-12-25 |
| 6820491 | Pressure differential measuring tool | Jain-Fa Lin | 2004-11-23 |
| 6273935 | Apparatus and method for trapping a toxic gas | Yung-Dar Chen, Fu-Shun Lo, Wen-Hsiung Wu | 2001-08-14 |
| 6042976 | Method of calibrating WEE exposure tool | Wen-Chong Chiang, Jung-Hau Hsiue, Yung-Dar Chen | 2000-03-28 |