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Automated sensitivity definition and calibration for design for manufacturing tools |
James A. Culp, Jason D. Hibbeler, Lars Liebmann |
2012-03-20 |
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Intersect area based ground rule for semiconductor design |
Albrik Avanessian, Henry A. Bonges, III, Dureseti Chidambarrao, Stephen E. Greco, Douglas W. Kemerer |
2011-05-10 |
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Raised source drain mosfet with amorphous notched gate cap layer with notch sidewalls passivated and filled with dielectric plug |
Werner Rausch, Sadanand V. Deshpande |
2010-04-20 |
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Methodology for layout-based modulation and optimization of nitride liner stress effect in compact models |
Dureseti Chidambarrao, Donald L. Jordan, Judith H. McCullen, David M. Onsongo, Richard Q. Williams |
2008-02-26 |
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Method of forming an electronic device on a recess in the surface of a thin film of silicon etched to a precise thickness |
Werner Rausch, Sadanand V. Deshpande |
2005-08-16 |
| 6878624 |
Pre-anneal of CoSi, to prevent formation of amorphous layer between Ti-O-N and CoSi |
John Bruley, Cyril Cabral, Jr., Christian Lavoie, Yun-Yu Wang, Horati S. Wildman +1 more |
2005-04-12 |
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Hard mask integrated etch process for patterning of silicon oxide and other dielectric materials |
Sadanand V. Desphande, David M. Dobuzinsky, Arpan Mahorowala, Richard S. Wise |
2005-03-22 |
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Structure and method for formation of a blocked silicide resistor |
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2003-12-09 |
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Method for forming a TiN layer on top of a metal silicide layer in a semiconductor structure and structure formed |
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2002-08-20 |
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Conversion of amorphous layer produced during IMP Ti deposition |
Anthony G. Domenicucci, Chung-Ping Eng, William J. Murphy, Yun-Yu Wang, Kwong Hon Wong |
2002-05-14 |
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Hard mask process to prevent surface roughness for selective dielectric etching |
Paul C. Jamison, Richard S. Wise, Hongwen Yan |
2002-02-12 |
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Method of contact structure formation |
Nancy Anne Greco, Stephen E. Greco |
2000-09-19 |
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Process for fabricating a semiconductor structure having a self-aligned spacer |
Michael D. Armacost, Sandra G. Malhotra, Richard S. Wise |
2000-07-18 |
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Process of etching an oxide layer |
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1998-09-22 |