PF

Philip L. Flaitz

IBM: 18 patents #6,125 of 70,183Top 9%
Infineon Technologies Ag: 2 patents #3,160 of 7,486Top 45%
KT Kabushiki Kaisha Toshiba: 1 patents #13,537 of 21,451Top 65%
MC Macronix International Co.: 1 patents #718 of 1,241Top 60%
SA Siemens Aktiengesellschaft: 1 patents #10,653 of 22,248Top 50%
Overall (All Time): #258,662 of 4,157,543Top 7%
18
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
8324605 Dielectric mesh isolated phase change structure for phase change memory Hsiang-Lan Lung, Chieh-Fang Chen, Yen-Hao Shih, Ming-Hsiu Lee, Matthew J. Breitwisch +3 more 2012-12-04
7951708 Copper interconnect structure with amorphous tantalum iridium diffusion barrier Patrick W. DeHaven, Daniel C. Edelstein, Takeshi Nogami, Stephen M. Rossnagel, Chih-Chao Yang 2011-05-31
7820559 Structure to improve adhesion between top CVD low-K dielectric and dielectric capping layer Lawrence A. Clevenger, Stefanie Chiras, Timothy J. Dalton, James J. Demarest, Darren N. Dunn +7 more 2010-10-26
7402532 Structure to improve adhesion between top CVD low-k dielectric and dielectric capping layer Lawrence A. Clevenger, Stefanie Chiras, Timothy J. Dalton, James J. Demarest, Derren N. Dunn +7 more 2008-07-22
7102232 Structure to improve adhesion between top CVD low-k dielectric and dielectric capping layer Lawrence A. Clevenger, Stefanie Chiras, Timothy J. Dalton, James J. Demarest, Derren N. Dunn +7 more 2006-09-05
6960514 Pitcher-shaped active area for field effect transistor and method of forming same Jochen Beintner, Rama Divakaruni, Johnathan E. Faltermeier, Oleg Gluschenkov, Carol J. Heenan +5 more 2005-11-01
6746933 Pitcher-shaped active area for field effect transistor and method of forming same Jochen Beintner, Rama Divakaruni, Johnathan E. Faltermeier, Oleg Gluschenkov, Carol J. Heenan +5 more 2004-06-08
6740568 Method to enhance epitaxial regrowth in amorphous silicon contacts Yun-Yu Wang, Johnathan E. Faltermeier, Colleen Snavely, Michael Maldei, Michael Iwatake +4 more 2004-05-25
6707086 Method for forming crystalline silicon nitride Rajarao Jammy, Philip Edward Batson, Hua Shen, Yun-Yu Wang 2004-03-16
6410399 Process to lower strap, wordline and bitline contact resistance in trench-based DRAMS by silicidization Herbert L. Ho, Subramanian S. Iyer, Babar A. Khan, Paul C. Parries 2002-06-25
6333531 Dopant control of semiconductor devices Yun-Yu Wang, Johnathan E. Faltermeier, Jeffery L. Hurd, Rajarao Jammy, Radhika Srinivasan +2 more 2001-12-25
6046487 Shallow trench isolation with oxide-nitride/oxynitride liner John Benedict, David M. Dobuzinsky, Erwin Hammerl, Herbert L. Ho, James F. Moseman +3 more 2000-04-04
5763315 Shallow trench isolation with oxide-nitride/oxynitride liner John Benedict, David M. Dobuzinsky, Erwin Hammerl, Herbert L. Ho, James F. Moseman +3 more 1998-06-09
5167913 Method of forming an adherent layer of metallurgy on a ceramic substrate John Acocella, Raj N. Master, Chandrasekhar Narayan, Sarah H. Knickerbocker, Paul H. Palmateer +2 more 1992-12-01
5130067 Method and means for co-sintering ceramic/metal MLC substrates Arlyne M. Flanagan, Joseph M. Harvilchuck, Lester W. Herron, John U. Knickerbocker, Robert W. Nufer +3 more 1992-07-14
4764341 Bonding of pure metal films to ceramics Raj N. Master, Paul H. Palmateer, Srinivasa S. N. Reddy 1988-08-16
4755631 Apparatus for providing an electrical connection to a metallic pad situated on a brittle dielectric substrate Robert W. Churchwell, James N. Humenik 1988-07-05
4672739 Method for use in brazing an interconnect pin to a metallization pattern situated on a brittle dielectric substrate Robert W. Churchwell, James N. Humenik 1987-06-16