Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12423803 | Predicting tool induced shift using Moiré overlay targets | Yatir Linden, Boaz Ophir, Mark Ghinovker | 2025-09-23 |
| 12100574 | Target and algorithm to measure overlay by modeling back scattering electrons on overlapping structures | Oliver Ache, Carey Phelps | 2024-09-24 |
| 12092966 | Device feature specific edge placement error (EPE) | Amnon Manassen, Frank Laske, Andrei V. Shchegrov | 2024-09-17 |
| 12055859 | Overlay mark design for electron beam overlay | Inna Steely-Tarshish, Stefan Eyring, Mark Ghinovker, Yoel Feler, Eitan Hajaj +4 more | 2024-08-06 |
| 12001148 | Enhancing performance of overlay metrology | Amnon Manassen, Andrew V. Hill, Yonatan Vaknin, Yossi Simon, Daria Negri +9 more | 2024-06-04 |
| 11862524 | Overlay mark design for electron beam overlay | Inna Steely-Tarshish, Stefan Eyring, Mark Ghinovker, Yoel Feler, Eitan Hajaj +4 more | 2024-01-02 |
| 11720031 | Overlay design for electron beam and scatterometry overlay measurements | Inna Steely-Tarshish, Stefan Eyring, Mark Ghinovker, Yoel Feler, Eitan Hajaj +4 more | 2023-08-08 |
| 11703767 | Overlay mark design for electron beam overlay | Inna Steely-Tarshish, Stefan Eyring, Mark Ghinovker, Yoel Feier, Eitan Hajaj +4 more | 2023-07-18 |
| 11698251 | Methods and systems for overlay measurement based on soft X-ray Scatterometry | Andrei V. Shchegrov, Alexander Kuznetsov, Antonio Arion Gellineau | 2023-07-11 |
| 11637030 | Multi-stage, multi-zone substrate positioning systems | Yoram Uziel, Ulrich Pohlmann, Frank Laske, Ariel Hildesheim, Aviv Balan | 2023-04-25 |
| 11592755 | Enhancing performance of overlay metrology | Amnon Manassen, Andrew V. Hill, Yonatan Vaknin, Yossi Simon, Daria Negri +9 more | 2023-02-28 |
| 11409205 | Non-orthogonal target and method for using the same in measuring misregistration of semiconductor devices | Itay Gdor, Yuval Lubashevsky, Yuri Paskover, Yoram Uziel | 2022-08-09 |
| 11353321 | Metrology system and method for measuring diagonal diffraction-based overlay targets | Roie Volkovich, Ohad Bachar | 2022-06-07 |
| 11209737 | Performance optimized scanning sequence for eBeam metrology and inspection | Henning Stoschus, Stefan Eyring, Ulrich Pohlmann, Inna Steely-Tarshish | 2021-12-28 |
| 11085754 | Enhancing metrology target information content | Eran Amit, Amnon Manassen | 2021-08-10 |
| 11075126 | Misregistration measurements using combined optical and electron beam technology | Roie Volkovich, Liran Yerushalmi | 2021-07-27 |
| 10897566 | Direct focusing with image binning in metrology tools | Boris Golovanevsky, Noam Gluzer | 2021-01-19 |
| 10866090 | Estimating amplitude and phase asymmetry in imaging technology for achieving high accuracy in overlay metrology | Tal Marciano, Yuri Paskover, Guy M. Cohen, Vladimir Levinski | 2020-12-15 |
| 10768533 | Method and system for generating programmed defects for use in metrology measurements | Hong Xiao | 2020-09-08 |
| 10684563 | On the fly target acquisition | Amnon Manassen, Andrew V. Hill, Yossi Simon, Alexander Novikov, Eugene Maslovsky | 2020-06-16 |
| 10622238 | Overlay measurement using phase and amplitude modeling | Moran Zaberchik, Eran Amit | 2020-04-14 |
| 10565697 | Utilizing overlay misregistration error estimations in imaging overlay metrology | Tzahi Grunzweig, David Gready, Mark Ghinovker, Vladimir Levinski, Claire E. Staniunas +2 more | 2020-02-18 |
| 10533848 | Metrology and control of overlay and edge placement errors | Andrei V. Shchegrov, Frank Laske | 2020-01-14 |
| 10504802 | Target location in semiconductor manufacturing | Naomi Ittah, Eran Amit, Vincent Immer, Einat Peled | 2019-12-10 |
| 10473460 | Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signals | Eran Amit, Stefan Eyring, Hari Pathangi, Frank Laske, Ulrich Pohlmann +1 more | 2019-11-12 |