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Multi-step pre-clean for selective metal gap fill |
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Multi-step pre-clean for selective metal gap fill |
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| 11355391 |
Method for forming a metal gapfill |
Xi Cen, Feiyue Ma, Kai Wu, Yu Lei, Kazuya Daito +13 more |
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| D942516 |
Process shield for a substrate processing chamber |
Manjunatha Koppa, Aravind Kamath, Cheng-Hsiung Tsai, Manjunath H. Venkataswamappa, Steven V. Sansoni |
2022-02-01 |
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Deposition ring for a substrate processing chamber |
Manjunatha Koppa, Aravind Kamath, Cheng-Hsiung Tsai, Manjunath H. Venkataswamappa, Steven V. Sansoni |
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Process shield for a substrate processing chamber |
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Directional SiO2 etch using plasma pre-treatment and high-temperature etchant deposition |
Joshua Collins, Mei Chang |
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Plasma cleaning apparatus and method |
Martin Deehan, Matt Cheng-Hsiung Tsai, Nan Lu, Mei Chang |
2017-01-24 |
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Directional SiO2 etch using plasma pre-treatment and high-temperature etchant deposition |
Joshua Collins, Mei Chang |
2016-01-26 |
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Directional SiO2 etch using low-temperature etchant deposition and plasma post-treatment |
Joshua Collins, Mei Chang |
2015-12-01 |
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Directional SiO2 etch using plasma pre-treatment and high-temperature etchant deposition |
Joshua Collins, Mei Chang |
2015-11-03 |
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Process chamber lid design with built-in plasma source for short lifetime species |
Chien-Teh Kao, Hyman Lam, Mei Chang, Nicholas R. Denny, Xiaoxiong Yuan |
2015-04-14 |
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Directional SIO2 etch using low-temperature etchant deposition and plasma post-treatment |
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Plasma cleaning apparatus and method |
Martin Deehan, Matt Cheng-Hsiung Tsai, Nan Lu, Mei Chang |
2014-05-13 |
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Selective etching of silicon nitride |
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Direct real-time monitoring and feedback control of RF plasma output for wafer processing |
Yu-Tzu Chang, William Kuang, Joel M. Huston, Chien-Teh Kao, Mei Chang |
2011-03-22 |
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Substrate support lift mechanism |
Eric W. Schieve, Keith Kuang-Kuo Koai, Rene T. Correa |
2011-01-18 |
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Substrate support lift pin |
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Reduced friction lift pin |
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2005-05-03 |
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300 mm CVD chamber design for metal-organic thin film deposition |
Keith Kuang-Kuo Koai, Fufa Chen, Lawrence Chung-Lai Lei |
2002-04-02 |
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Magnetron with cooling system for process chamber of processing system |
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1999-09-21 |
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High conductance low wall deposition upper shield |
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1998-12-29 |
