TS

Theodorus E. Standaert

IBM: 284 patents #82 of 70,183Top 1%
Globalfoundries: 18 patents #182 of 4,424Top 5%
TE Tessera: 10 patents #41 of 271Top 20%
Samsung: 1 patents #49,284 of 75,807Top 70%
AM AMD: 1 patents #5,683 of 9,279Top 65%
SS Stmicroelectronics Sa: 1 patents #938 of 1,676Top 60%
AS Adeia Semiconductor Solutions: 1 patents #22 of 57Top 40%
RE Renesas Electronics: 1 patents #2,739 of 4,529Top 65%
📍 Clifton Park, NY: #2 of 1,126 inventorsTop 1%
🗺 New York: #54 of 115,490 inventorsTop 1%
Overall (All Time): #1,202 of 4,157,543Top 1%
309
Patents All Time

Issued Patents All Time

Showing 276–300 of 309 patents

Patent #TitleCo-InventorsDate
8617961 Post-gate isolation area formation for fin field effect transistor device Balasubramanian S. Haran, Sanjay C. Mehta 2013-12-31
8604539 Bulk fin-field effect transistors with well defined isolation Kangguo Cheng, Balasubramanian S. Haran, Shom Ponoth, Tenko Yamashita 2013-12-10
8604546 Reducing gate resistance in nonplanar multi-gate transistor Andres Bryant, Gen Tsutsui, Chun-Chen Yeh 2013-12-10
8592263 FinFET diode with increased junction area Kangguo Cheng, Balasubramanian S. Haran, Shom Ponoth, Tenko Yamashita 2013-11-26
8592290 Cut-very-last dual-EPI flow Veeraraghavan S. Basker, Huiming Bu, Kangguo Cheng, Balasubramanian S. Haran, Nicolas Loubet +3 more 2013-11-26
8581320 MOS capacitors with a finfet process Kangguo Cheng, Balasubramanian S. Haran, Shom Ponoth, Tenko Yamashita 2013-11-12
8569125 FinFET with improved gate planarity Kangguo Cheng, Balasubramanian S. Haran, Shom Ponoth, Soon-Cheon Seo, Tenko Yamashita 2013-10-29
8569152 Cut-very-last dual-epi flow Veeraraghavan S. Basker, Huiming Bu, Kangguo Cheng, Balasubramanian S. Haran, Nicolas Loubet +3 more 2013-10-29
8455313 Method for fabricating finFET with merged fins and vertical silicide Veeraraghavan S. Basker, Andres Bryant, Huiming Bu, Wilfried E. Haensch, Effendi Leobandung +3 more 2013-06-04
8445334 SOI FinFET with recessed merged Fins and liner for enhanced stress coupling Veeraraghavan S. Basker, Huiming Bu, Effendi Leobandung, Tenko Yamashita, Chun-Chen Yeh 2013-05-21
8432002 Method and structure for low resistive source and drain regions in a replacement metal gate process flow Balasubramanian S. Haran, Kangguo Cheng, Shom Ponoth, Tenko Yamashita 2013-04-30
8420459 Bulk fin-field effect transistors with well defined isolation Kangguo Cheng, Balasubramanian S. Haran, Shom Ponoth, Tenko Yamashita 2013-04-16
8298948 Capping of copper interconnect lines in integrated circuit devices Griselda Bonilla, Kaushik Chanda, Ronald G. Filippi, Stephan Grunow, David L. Rath +3 more 2012-10-30
8084311 Method of forming replacement metal gate with borderless contact and structure thereof David V. Horak, Su Chen Fan 2011-12-27
8056039 Interconnect structure for integrated circuits having improved electromigration characteristics Kaushik Chanda, Ronald G. Filippi, Stephan Grunow, Chao-Kun Hu, Sujatha Sankaran +1 more 2011-11-08
7968456 Method of forming an embedded barrier layer for protection from chemical mechanical polishing process Paul S. McLaughlin, Sujatha Sankaran 2011-06-28
7964966 Via gouged interconnect structure and method of fabricating same Chih-Chao Yang, Daniel C. Edelstein 2011-06-21
7943453 CMOS devices with different metals in gate electrodes using spin on low-k material as hard mask Bernd Kastenmeier, Byoung Hun Lee, Naim Moumen 2011-05-17
7902061 Interconnect structures with encasing cap and methods of making thereof Lawrence A. Clevenger, Timothy J. Dalton, Louis C. Hsu, Carl Radens, Keith Kwong Hon Wong +1 more 2011-03-08
7816271 Methods for forming contacts for dual stress liner CMOS semiconductor devices Kyoung-Woo Lee, Ja-Hum Ku, Wanjae Park, Chong-Kwang Chang 2010-10-19
7776737 Reliability of wide interconnects Griselda Bonilla, Kaushik Chanda, Ronald G. Filippi, Stephan Grunow, Sujatha Sankaran +1 more 2010-08-17
7737528 Structure and method of forming electrically blown metal fuses for integrated circuits Griselda Bonilla, Kaushik Chanda, Ronald G. Filippi, Jeffrey P. Gambino, Stephan Grunow +3 more 2010-06-15
7671362 Test structure for determining optimal seed and liner layer thicknesses for dual damascene processing Tibor Bolom, Kaushik Chanda, Ronald G. Filippi, Stephan Grunow, Paul S. McLaughlin +3 more 2010-03-02
7645700 Dry etchback of interconnect contacts William Brearley, Stephen E. Greco, Sujatha Sankaran 2010-01-12
7488677 Interconnect structures with encasing cap and methods of making thereof Kwong Hon Wong, Louis C. Hsu, Timothy J. Dalton, Carol Radens, Chih-Chao Yang +1 more 2009-02-10