Issued Patents All Time
Showing 26–50 of 225 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11205587 | Liner and cap structures for reducing local interconnect vertical resistance without compromising reliability | Su Chen Fan, Raghuveer R. Patlolla, Cornelius Brown Peethala | 2021-12-21 |
| 11195762 | Multi-metal dipole doping to offer multi-threshold voltage pairs without channel doping for highly scaling CMOS device | Ruqiang Bao, Vijay Narayanan, Terence B. Hook | 2021-12-07 |
| 11177257 | Fabrication of field effect transistors with different threshold voltages through modified channel interfaces | Takashi Ando, Ruqiang Bao, Choonghyun Lee | 2021-11-16 |
| 11152265 | Local isolation of source/drain for reducing parasitic capacitance in vertical field effect transistors | Ruilong Xie, Christopher J. Waskiewicz, Alexander Reznicek | 2021-10-19 |
| 11145555 | Gate-last process for vertical transport field-effect transistor | Shogo Mochizuki, Choonghyun Lee | 2021-10-12 |
| 11121209 | Surface area enhancement for stacked metal-insulator-metal (MIM) capacitor | Takashi Ando, Eduard A. Cartier, Paul C. Jamison, Vijay Narayanan | 2021-09-14 |
| 11094801 | Oxide isolated fin-type field-effect transistors | Ruqiang Bao, Paul C. Jamison, Choonghyun Lee | 2021-08-17 |
| 11088033 | Low resistance source-drain contacts using high temperature silicides | Praneet Adusumilli, Christian Lavoie, Ahmet S. Ozcan | 2021-08-10 |
| 11062956 | Low resistance source-drain contacts using high temperature silicides | Praneet Adusumilli, Christian Lavoie, Ahmet S. Ozcan | 2021-07-13 |
| 10978550 | Efficient metal-insulator-metal capacitor | Kisup Chung, Isabel C. Estrada-Raygoza, Chi-Chun Liu, Yann Mignot, Hao Tang | 2021-04-13 |
| 10978551 | Surface area enhancement for stacked metal-insulator-metal (MIM) capacitor | Takashi Ando, Eduard A. Cartier, Paul C. Jamison, Vijay Narayanan | 2021-04-13 |
| 10971626 | Interface charge reduction for SiGe surface | Devendra K. Sadana, Dechao Guo, Joel P. de Souza, Ruqiang Bao, Stephen W. Bedell +3 more | 2021-04-06 |
| 10937890 | Vertical field-effect transistor late gate recess process with improved inter-layer dielectric protection | Wenyu Xu, Ruilong Xie, Pietro Montanini | 2021-03-02 |
| 10930567 | Maskless epitaxial growth of phosphorus-doped Si and boron-doped SiGe (Ge) for advanced source/drain contact | Choonghyun Lee, Shogo Mochizuki, Chun Wing Yeung | 2021-02-23 |
| 10930566 | Complementary metal oxide semiconductor replacement gate high-k metal gate devices with work function adjustments | Lisa F. Edge, Paul C. Jamison, Vamsi K. Paruchuri | 2021-02-23 |
| 10916432 | Formation of pure silicon oxide interfacial layer on silicon-germanium channel field effect transistor device | Takashi Ando, Pouya Hashemi, Choonghyun Lee, Vijay Narayanan | 2021-02-09 |
| 10892336 | Wrap-around-contact structure for top source/drain in vertical FETS | Choonghyun Lee, Christopher J. Waskiewicz, Alexander Reznicek | 2021-01-12 |
| 10892339 | Gate first technique in vertical transport FET using doped silicon gates with silicide | Ruqiang Bao, Paul C. Jamison, Choonghyun Lee, Sanjay C. Mehta, Vijay Narayanan | 2021-01-12 |
| 10886362 | Multilayer dielectric for metal-insulator-metal capacitor (MIMCAP) capacitance and leakage improvement | Takashi Ando, Eduard A. Cartier, Paul C. Jamison | 2021-01-05 |
| 10832969 | Single-fin CMOS transistors with embedded and cladded source/drain structures | Xin Miao, Choonghyun Lee, Shogo Mochizuki | 2020-11-10 |
| 10833150 | Fast recrystallization of hafnium or zirconium based oxides in insulator-metal structures | Martin M. Frank, Kam-Leung Lee, Eduard A. Cartier, Vijay Narayanan, Jean Fompeyrine +2 more | 2020-11-10 |
| 10833173 | Low-resistance top contact on VTFET | Christopher J. Waskiewicz, Su Chen Fan, Hari Prasad Amanapu | 2020-11-10 |
| 10832975 | Reduced static random access memory (SRAM) device foot print through controlled bottom source/drain placement | Ruqiang Bao, Brent A. Anderson, Junli Wang, Kangguo Cheng, Choonghyun Lee | 2020-11-10 |
| 10833148 | Leakage current reduction in stacked metal-insulator-metal capacitors | Takashi Ando, Paul C. Jamison, John Rozen | 2020-11-10 |
| 10833172 | Gate stack reliability in vertical transport field effect transistors | Choonghyun Lee, Christopher J. Waskiewicz, Miaomiao Wang | 2020-11-10 |