Issued Patents All Time
Showing 26–50 of 91 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10930550 | Barrier for copper metallization and methods of forming | Sang Ho Yu, Lu Chen | 2021-02-23 |
| 10608097 | Low thickness dependent work-function nMOS integration for metal gate | Paul F. Ma, Shih Chung Chen, Rajesh Sathiyanarayanan, Atashi Basu, Lin Dong +3 more | 2020-03-31 |
| 10487398 | Synthesis of metal nitride thin films materials using hydrazine derivatives | Byunghoon Yoon, Siddarth A. Krishnan, Paul F. Ma, Sang Ho Yu | 2019-11-26 |
| 10358719 | Selective deposition of aluminum oxide on metal surfaces | Sang Ho Yu | 2019-07-23 |
| 10199230 | Methods for selective deposition of metal silicides via atomic layer deposition cycles | Yixiong Yang, Bhushan Zope, Xinyu Fu, Avgerinos V. Gelatos, Guoqiang Jian +1 more | 2019-02-05 |
| 10109534 | Multi-threshold voltage (Vt) workfunction metal by selective atomic layer deposition (ALD) | Adam Brand, Naomi Yoshida, David Thompson, Mei Chang | 2018-10-23 |
| 9926639 | Methods for forming barrier/seed layers for copper interconnect structures | Hoon Kim, Wei Ti Lee, Sang Ho Yu, Hyoung-Chan Ha, Sang-Hyeob Lee | 2018-03-27 |
| 9748354 | Multi-threshold voltage structures with a lanthanum nitride film and methods of formation thereof | Wei V. Tang, Paul F. Ma, Steven C. H. Hung, Michael P. Chudzik, Siddarth A. Krishnan +6 more | 2017-08-29 |
| 9683287 | Deposition of films comprising aluminum alloys with high aluminum content | David Thompson, Srinivas Gandikota, Xinliang Lu, Wei V. Tang, Jing Zhou +6 more | 2017-06-20 |
| 9595466 | Methods for etching via atomic layer deposition (ALD) cycles | Xinyu Fu, Srinivas Gandikota, Mei Chang, Guoqiang Jian, Yixiong Yang +2 more | 2017-03-14 |
| 9530627 | Method for cleaning titanium alloy deposition | Srinivas Gandikota, Xinliang Lu, Kyoung-Ho BU, Jing Zhou, David Thompson | 2016-12-27 |
| 9514933 | Film deposition using spatial atomic layer deposition or pulsed chemical vapor deposition | Yu Lei, Srinivas Gandikota, Bo Zheng, Rajkumar Jakkaraju, Martin Jeff Salinas +1 more | 2016-12-06 |
| 9269584 | N-metal film deposition with initiation layer | Xinliang Lu, Atif Noori, Maitreyee Mahajani, Shih Chung Chen, Mei Chang | 2016-02-23 |
| 9230835 | Integrated platform for fabricating n-type metal oxide semiconductor (NMOS) devices | Avgerinos V. Gelatos, Srinivas Gandikota, Xinyu Fu, Bo Zheng, Yu Lei | 2016-01-05 |
| 9209074 | Cobalt deposition on barrier surfaces | Jiang Lu, Hyoung-Chan Ha, Paul F. Ma, Joseph AuBuchon, Sang Ho Yu +1 more | 2015-12-08 |
| 9202674 | Plasma reactor with a ceiling electrode supply conduit having a succession of voltage drop elements | Olkan Cuvalci, Yu Chang, William Kuang, Anqing Cui | 2015-12-01 |
| 9145612 | Deposition of N-metal films comprising aluminum alloys | Srinivas Gandikota, Xinliang Lu, Shih Chung Chen, Wei V. Tang, Jing Zhou +8 more | 2015-09-29 |
| 9129945 | Formation of liner and barrier for tungsten as gate electrode and as contact plug to reduce resistance and enhance device performance | Sang-Hyeob Lee, Sang Ho Yu, Wei Ti Lee, Hyoung-Chan Ha, Hoon Kim | 2015-09-08 |
| 9051641 | Cobalt deposition on barrier surfaces | Jiang Lu, Hyoung-Chan Ha, Paul F. Ma, Joseph AuBuchon, Sang Ho Yu +1 more | 2015-06-09 |
| 9048183 | NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors | Srinivas Gandikota, Yu Lei, Xinliang Lu, Sang Ho Yu, Hoon Kim +4 more | 2015-06-02 |
| 9032906 | Apparatus and process for plasma-enhanced atomic layer deposition | Paul F. Ma, Kavita Shah, Dien-Yeh Wu, Christophe Marcadal, Frederick Wu +1 more | 2015-05-19 |
| 8987080 | Methods for manufacturing metal gates | Xinliang Lu, Atif Noori, Maitreyee Mahajani, Shih Chung Chen, Yu Lei +3 more | 2015-03-24 |
| 8951478 | Ampoule with a thermally conductive coating | Schubert S. Chu, Christophe Marcadal, Norman Nakashima, Dien-Yeh Wu | 2015-02-10 |
| 8927059 | Deposition of metal films using alane-based precursors | Xinliang Lu, David Thompson, Jeffrey W. Anthis, Mei Chang, Wei V. Tang +2 more | 2015-01-06 |
| 8895443 | N-metal film deposition with initiation layer | Xinliang Lu, Atif Noori, Maitreyee Mahajani, Shih Chung Chen, Mei Chang | 2014-11-25 |