Issued Patents All Time
Showing 51–75 of 91 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8815724 | Process for forming cobalt-containing materials | Schubert S. Chu, Mei Chang, Sang Ho Yu, Kevin Moraes, See-Eng Phan | 2014-08-26 |
| 8765601 | Post deposition treatments for CVD cobalt films | Yu Lei, Xinyu Fu, Anantha K. Subramani, Srinivas Gandikota | 2014-07-01 |
| 8642468 | NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors | Srinivas Gandikota, Yu Lei, Xinliang Lu, Sang Ho Yu, Hoon Kim +4 more | 2014-02-04 |
| 8637390 | Metal gate structures and methods for forming thereof | Sang Ho Yu, Sang-Hyeob Lee, Hyoung-Chan Ha, Wei Ti Lee, Hoon Kim +4 more | 2014-01-28 |
| 8637410 | Method for metal deposition using hydrogen plasma | Anantha K. Subramani, John C. Forster, Michael S. Jackson, Xinliang Lu, Wei Wang +2 more | 2014-01-28 |
| 8592305 | Doping aluminum in tantalum silicide | Xinliang Lu, Shih Chung Chen, Atif Noori, Maitreyee Mahajani, Mei Chang | 2013-11-26 |
| 8563424 | Process for forming cobalt and cobalt silicide materials in tungsten contact applications | Sang Ho Yu, See-Eng Phan, Mei Chang, Amit Khandelwal, Hyoung-Chan Ha | 2013-10-22 |
| 8524600 | Post deposition treatments for CVD cobalt films | Yu Lei, Xinyu Fu, Anantha K. Subramani, Srinivas Gandikota | 2013-09-03 |
| 8187970 | Process for forming cobalt and cobalt silicide materials in tungsten contact applications | Sang Ho Yu, See-Eng Phan, Mei Chang, Amit Khandelwal, Hyoung-Chan Ha | 2012-05-29 |
| 8110489 | Process for forming cobalt-containing materials | Schubert S. Chu, Mei Chang, Sang Ho Yu, Kevin Moraes, See-Eng Phan | 2012-02-07 |
| 8062422 | Method and apparatus for generating a precursor for a semiconductor processing system | Ling Chen, Vincent Ku, Hua Chung, Christophe Marcadal, Jenny Lin +3 more | 2011-11-22 |
| 7910165 | Ruthenium layer formation for copper film deposition | Kavita Shah, Nirmaya Maity, Mei Chang | 2011-03-22 |
| 7850779 | Apparatus and process for plasma-enhanced atomic layer deposition | Paul F. Ma, Kavita Shah, Dien-Yeh Wu, Christophe Marcadal, Frederick Wu +1 more | 2010-12-14 |
| 7832432 | Chemical delivery apparatus for CVD or ALD | Norman Nakashima, Christophe Marcadal, Paul F. Ma, Schubert S. Chu | 2010-11-16 |
| 7833358 | Method of recovering valuable material from exhaust gas stream of a reaction chamber | Schubert S. Chu, Frederick Wu, Christophe Marcadal, Dien-Yeh Wu, Kavita Shah +1 more | 2010-11-16 |
| 7748400 | Chemical delivery apparatus for CVD or ALD | Norman Nakashima, Christophe Marcadal, Paul F. Ma, Schubert S. Chu | 2010-07-06 |
| 7691442 | Ruthenium or cobalt as an underlayer for tungsten film deposition | Srinivas Gandikota, Madhu Moorthy, Amit Khandelwal, Avgerinos V. Gelatos, Mei Chang +1 more | 2010-04-06 |
| 7682946 | Apparatus and process for plasma-enhanced atomic layer deposition | Paul F. Ma, Kavita Shah, Dien-Yeh Wu, Christophe Marcadal, Frederick Wu +1 more | 2010-03-23 |
| 7678194 | Method for providing gas to a processing chamber | Ling Chen, Vincent Ku | 2010-03-16 |
| 7597758 | Chemical precursor ampoule for vapor deposition processes | Ling Chen, Vincent Ku, Hua Chung, Christophe Marcadal, Jenny Lin +3 more | 2009-10-06 |
| 7588736 | Apparatus and method for generating a chemical precursor | Ling Chen, Vincent Ku, Hua Chung, Christophe Marcadal, Jenny Lin +3 more | 2009-09-15 |
| 7576002 | Multi-step barrier deposition method | Ling Chen, Wei Cao, Christophe Marcadal | 2009-08-18 |
| 7569191 | Method and apparatus for providing precursor gas to a processing chamber | Ling Chen, Vincent Ku | 2009-08-04 |
| 7568495 | Chemical delivery apparatus for CVD or ALD | Norman Nakashima, Christophe Marcadal, Paul F. Ma, Schubert S. Chu | 2009-08-04 |
| 7562672 | Chemical delivery apparatus for CVD or ALD | Norman Nakashima, Christophe Marcadal, Paul F. Ma, Schubert S. Chu | 2009-07-21 |