Issued Patents All Time
Showing 26–50 of 63 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9305838 | BEOL interconnect with carbon nanotubes | JOE GRIFFITH CRUZ, Arvind Sundarrajan, Murali Narasimhan, Subbalakshmi Sreekala, Victor L. Pushparaj | 2016-04-05 |
| 9111980 | Gas exhaust for high volume, low cost system for epitaxial silicon deposition | David K. Carlson, Michael R. Rice, Kartik Shah, Kashif Maqsood | 2015-08-18 |
| 8921235 | Controlled air gap formation | Kiran V. Thadani, Jingjing Xu, Abhijit Basu Mallick, Joe Griffith Cruz, Nitin K. Ingle | 2014-12-30 |
| 8662941 | Wire holder and terminal connector for hot wire chemical vapor deposition chamber | Victor L. Pushparaj, Dieter Haas | 2014-03-04 |
| 8642376 | Methods for depositing a material atop a substrate | Sukti Chatterjee, Annamalai Lakshmanan, Joe Griffith Cruz | 2014-02-04 |
| 8603195 | 3D approach on battery and supercapitor fabrication by initiation chemical vapor deposition techniques | Victor L. Pushparaj, Omkaram Nalamasu | 2013-12-10 |
| 8343279 | Apparatuses for atomic layer deposition | Nyi O. Myo, Kenric Choi, Shreyas Kher, Steve Poppe, Craig Metzner +1 more | 2013-01-01 |
| 8334017 | Apparatus and methods for forming energy storage and photovoltaic devices in a linear system | Victor L. Pushparaj, Dieter Haas, Bipin Thakur, Mahesh Arcot, Vikas Gujar +1 more | 2012-12-18 |
| 8323754 | Stabilization of high-k dielectric materials | Christopher S. Olsen, Shreyas Kher, Randhir P. S. Thakur, Shankar Muthukrishnan, Philip Allan Kraus | 2012-12-04 |
| 8282992 | Methods for atomic layer deposition of hafnium-containing high-K dielectric materials | Nyi O. Myo, Kenric Cho, Shreyas Kher, Steve Poppe, Craig Metzner +1 more | 2012-10-09 |
| 8117987 | Hot wire chemical vapor deposition (CVD) inline coating tool | Dieter Haas, Randhir P. S. Thakur | 2012-02-21 |
| 8119210 | Formation of a silicon oxynitride layer on a high-k dielectric material | Gregg Higashi | 2012-02-21 |
| 7871942 | Methods for manufacturing high dielectric constant film | Shreyas Kher, Khaled Ahmed, Yi Ma | 2011-01-18 |
| 7794544 | Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system | Son T. Nguyen, Kedarnath Sangam, Miriam Schwartz, Kenric Choi, Sanjay Bhat +4 more | 2010-09-14 |
| 7775508 | Ampoule for liquid draw and vapor draw with a continuous level sensor | Kenric Choi, Shreyas Kher, Son T. Nguyen, Paul Deaton, Khai Ngo +3 more | 2010-08-17 |
| 7658973 | Tailoring nitrogen profile in silicon oxynitride using rapid thermal annealing with ammonia under ultra-low pressure | Gary E. Miner, Arnaud Lepert | 2010-02-09 |
| 7294205 | Method for reducing the intrinsic stress of high density plasma films | K. V. Ravi, Kent Rossman, Turgut Sahin | 2007-11-13 |
| 6677254 | Processes for making a barrier between a dielectric and a conductor and products produced therefrom | Mouloud Bakli, Ravi Rajagopalan, Randall S. Urdahl, Asher Sinensky, Shankarram Athreya | 2004-01-13 |
| 6617266 | Barium strontium titanate annealing process | Annabel Nickles, Ravi Rajagopalan | 2003-09-09 |
| 6579811 | Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps through wafer heating | Sameer Desai, Walter Zygmunt, Turgut Sahin, Laxman Murugesh | 2003-06-17 |
| 6573150 | Integration of CVD tantalum oxide with titanium nitride and tantalum nitride to form MIM capacitors | Randall S. Urdahl, Shankarrram A. Athreya, Asher Sinensky, Andrea M. Mendoza | 2003-06-03 |
| 6548368 | Method of forming a MIS capacitor | Ravi Rajagopalan | 2003-04-15 |
| 6534360 | Process for depositing layers on a semiconductor wafer | Jun Zhao | 2003-03-18 |
| 6518203 | Method and apparatus for integrating a metal nitride film in a semiconductor device | Turgut Sahin | 2003-02-11 |
| 6475854 | Method of forming metal electrodes | Annabel Nickles, Xiaoliang Jin, Deepak Upadhyaya, Yaxin Wang | 2002-11-05 |