Issued Patents All Time
Showing 51–63 of 63 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6454860 | Deposition reactor having vaporizing, mixing and cleaning capabilities | Craig Metzner, Turgut Sahin, Gregory Redinbo, Patricia M. Liu | 2002-09-24 |
| 6387761 | Anneal for enhancing the electrical characteristic of semiconductor devices | Wong-Cheng Shih, Randall S. Urdahl, Turgut Sahin | 2002-05-14 |
| 6337289 | Method and apparatus for integrating a metal nitride film in a semiconductor device | Turgut Sahin | 2002-01-08 |
| 6274058 | Remote plasma cleaning method for processing chambers | Ravi Rajagopalan, Patricia M. Liu, Huyen Tran, Padmanabhan Krishnaraj, Alan Ablao +1 more | 2001-08-14 |
| 6218300 | Method and apparatus for forming a titanium doped tantalum pentaoxide dielectric layer using CVD | Turgut Sahin, Randall S. Urdahl, Ankineedu Velaga, Patricia M. Liu | 2001-04-17 |
| 6217658 | Sequencing of the recipe steps for the optimal low-dielectric constant HDP-CVD Processing | Maciek Orczyk, Laxman Murugesh | 2001-04-17 |
| 6204203 | Post deposition treatment of dielectric films for interface control | Turgut Sahin, Gregory Redinbo, Patricia M. Liu, Huyen Tran | 2001-03-20 |
| 6200911 | Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps using differential plasma power | Sameer Desai, Walter Zygmunt, Turgut Sahin, Laxman Murugesh | 2001-03-13 |
| 6136685 | High deposition rate recipe for low dielectric constant films | Laxman Murugesh, Turgut Sahin, Maciek Orczyk, Jianmin Qiao | 2000-10-24 |
| 6037235 | Hydrogen anneal for curing defects of silicon/nitride interfaces of semiconductor devices | Randall S. Urdahl, Turgut Sahin, Wong-Cheng Shih | 2000-03-14 |
| 5976993 | Method for reducing the intrinsic stress of high density plasma films | K. V. Ravi, Kent Rossman, Turgut Sahin | 1999-11-02 |
| 5937323 | Sequencing of the recipe steps for the optimal low-k HDP-CVD processing | Maciek Orczyk, Laxman Murugesh | 1999-08-10 |
| 5811356 | Reduction in mobile ion and metal contamination by varying season time and bias RF power during chamber cleaning | Laxman Murugesh, Turgut Sahin, Kent Rossman | 1998-09-22 |