Issued Patents All Time
Showing 51–75 of 81 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9396933 | PVD buffer layers for LED fabrication | Mingwei Zhu, Rongjun Wang, Nag B. Patibandia, Xianmin Tang, Vivek Agrawal +5 more | 2016-07-19 |
| 9343274 | Process kit shield for plasma enhanced processing chamber | Donny Young, Kirankumar Neelasandra SAVANDAIAH, Uday Pai | 2016-05-17 |
| 9303311 | Substrate processing system with mechanically floating target assembly | Donny Young, Alan A. Ritchie, Uday Pai, Keith A. Miller | 2016-04-05 |
| 9281167 | Variable radius dual magnetron | Thanh X. Nguyen, Rongjun Wang, Xianmin Tang | 2016-03-08 |
| 9255322 | Substrate processing system having symmetric RF distribution and return paths | Donny Young, Alan A. Ritchie, Keith A. Miller | 2016-02-09 |
| 9222172 | Surface treated aluminum nitride baffle | Dmitry Lubomirsky | 2015-12-29 |
| 9202736 | Method for refurbishing an electrostatic chuck with reduced plasma penetration and arcing | Kadthala Ramaya Narendrnath, Dmitry Lubomirsky, Xinglong Chen, Sudhir Gondhalekar, Tony Kaushal | 2015-12-01 |
| 9177763 | Method and apparatus for measuring pressure in a physical vapor deposition chamber | Alan A. Ritchie, Isaac Porras, Keith A. Miller | 2015-11-03 |
| 9087679 | Uniformity tuning capable ESC grounding kit for RF PVD chamber | Rongjun Wang, Thanh X. Nguyen, Alan A. Ritchie | 2015-07-21 |
| 8968537 | PVD sputtering target with a protected backing plate | Rongjun Wang | 2015-03-03 |
| 8911601 | Deposition ring and electrostatic chuck for physical vapor deposition chamber | Keith A. Miller, Rongjun Wang | 2014-12-16 |
| 8895450 | Low resistivity tungsten PVD with enhanced ionization and RF power coupling | Yong Cao, Xianmin Tang, Srinivas Gandikota, Wei Wang, Zhendong Liu +3 more | 2014-11-25 |
| 8795488 | Apparatus for physical vapor deposition having centrally fed RF energy | Lara Hawrylchak, Michael S. Cox, Donny Young, Kirankumar Neelasandra SAVANDAIAH, Alan A. Ritchie | 2014-08-05 |
| 8702918 | Apparatus for enabling concentricity of plasma dark space | Alan A. Ritchie, Donny Young, Keith A. Miller, Steve Sansoni, Uday Pai | 2014-04-22 |
| 8647485 | Process kit shield for plasma enhanced processing chamber | Donny Young, Kirankumar Neelasandra SAVANDAIAH, Uday Pai | 2014-02-11 |
| 8580094 | Magnetron design for RF/DC physical vapor deposition | Rongjun Wang, Sally S. Lou, Jianxin Lei, Xianmin Tang, Srinivas Gandikota +4 more | 2013-11-12 |
| 8558299 | Semiconductor device with gate electrode stack including low resistivity tungsten and method of forming | Yong Cao, Xianmin Tang, Srinivas Gandikota, Wei Wang, Zhendong Liu +3 more | 2013-10-15 |
| 8409355 | Low profile process kit | Teruki Iwashita, Hiroshi Otake, Yuki Koga, Kazutoshi Maehara, Xinglong Chen +2 more | 2013-04-02 |
| 8252410 | Ceramic cover wafers of aluminum nitride or beryllium oxide | — | 2012-08-28 |
| 8108981 | Method of making an electrostatic chuck with reduced plasma penetration and arcing | Dmitry Lubomirsky, Kadthala Ramaya Narendranath, Xinglong Chen, Sudhir Gondhalekar, Tony Kaushal | 2012-02-07 |
| 8022377 | Method and apparatus for excimer curing | Dmitry Lubomirsky, Ellie Yieh | 2011-09-20 |
| 7964040 | Multi-port pumping system for substrate processing chambers | Dmitry Lubomirsky, James Santosa | 2011-06-21 |
| 7848076 | Method and apparatus for providing an electrostatic chuck with reduced plasma penetration and arcing | Kadthala Ramaya Narendranath, Dmitry Lubomirsky, Xinglong Chen, Sudhir Goodhalekar, Tony Kaushal | 2010-12-07 |
| 7811411 | Thermal management of inductively coupled plasma reactors | Siqing Lu, Qiwei Liang, Irene Chou, Steven H. Kim, Young S. Lee +1 more | 2010-10-12 |
| 7789993 | Internal balanced coil for inductively coupled high density plasma processing chamber | Robert Chen, Canfeng Lai, Xinglong Chen, Weiyi Luo, Zhong Qiang Hua +4 more | 2010-09-07 |