Patent Leaderboard
USPTO Patent Rankings Data through Sept 30, 2025
FM

Farhad Moghadam

Applied Materials: 47 patents #175 of 7,310Top 3%
INIntel: 8 patents #4,870 of 30,777Top 20%
Los Gatos, CA: #110 of 2,986 inventorsTop 4%
California: #6,736 of 386,348 inventorsTop 2%
Overall (All Time): #45,838 of 4,157,543Top 2%
55 Patents All Time

Issued Patents All Time

Showing 26–50 of 55 patents

Patent #TitleCo-InventorsDate
6734115 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2004-05-11
6706138 Adjustable dual frequency voltage dividing plasma reactor Michael Barnes, John Holland, Alexander Paterson, Valentin Todorov 2004-03-16
6669858 Integrated low k dielectrics and etch stops Claes Bjorkman, Min Melissa Yu, Hongquing Shan, David Cheung, Wai-Fan Yau +7 more 2003-12-30
6667248 Low-bias-deposited high-density-plasma chemical-vapor-deposition silicate glass layers Hichem M'Saad, Chad Peterson, Zhuang Li, Anchuan Wang 2003-12-23
6660656 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2003-12-09
6632735 Method of depositing low dielectric constant carbon doped silicon oxide Wai-Fan Yau, Ju-Hyung Lee, Nasreen Chopra, Tzu-Fang Huang, David Cheung +5 more 2003-10-14
6596655 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2003-07-22
6593247 Method of depositing low k films using an oxidizing plasma Tzu-Fang Huang, Yung-Cheng Lu, Li-Qun Xia, Ellie Yieh, Wai-Fan Yau +5 more 2003-07-15
6583071 Ultrasonic spray coating of liquid precursor for low K dielectric coatings Timothy Weidman, Yunfeng Lu, Michael P. Nault, Michael Barnes 2003-06-24
6562690 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2003-05-13
6541282 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2003-04-01
6521546 Method of making a fluoro-organosilicate layer Michael Barnes, Hichem M'Saad, Huong Nguyen 2003-02-18
6511923 Deposition of stable dielectric films Yaxin Wang, Michael Barnes, Thanh Pham 2003-01-28
6495470 Contact and via fabrication technologies S. M. Reza Sadjadi, Mansour Moinpour, Te Hua Lin 2002-12-17
6448187 Method of improving moisture resistance of low dielectric constant films Wai-Fan Yau, David Cheung, Nasreen Chopra, Yung-Cheng Lu, Robert P. Mandal 2002-09-10
6413583 Formation of a liquid-like silica layer by reaction of an organosilicon compound and a hydroxyl forming compound David Cheung, Ellie Yieh, Li-Qun Xia, Wai-Fan Yau, Chi-I Lang +4 more 2002-07-02
6410457 Method for improving barrier layer adhesion to HDP-FSG thin films Hichem M'Saad, Dana Tribula, Manoj Vellaikal, Sameer Desai 2002-06-25
6383954 Process gas distribution for forming stable fluorine-doped silicate glass and other films Yaxin Wang, Diana Chan, Turgut Sahin, Tetsuya Ishikawa 2002-05-07
6348725 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2002-02-19
6340435 Integrated low K dielectrics and etch stops Claes Bjorkman, Min Melissa Yu, Hongquing Shan, David Cheung, Wai-Fan Yau +7 more 2002-01-22
6303523 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2001-10-16
6245690 Method of improving moisture resistance of low dielectric constant films Wai-Fan Yau, David Cheung, Nasreen Chopra, Yung-Cheng Lu, Robert P. Mandal 2001-06-12
6170428 Symmetric tunable inductively coupled HDP-CVD reactor Fred C. Redeker, Hiroji Hanawa, Tetsuya Ishikawa, Dan Maydan, Shijian Li +5 more 2001-01-09
5883436 Contact and via fabrication technologies S. M. Reza Sadjadi, Mansour Moinpour, Te Hua Lin 1999-03-16
5872064 DSAD process for deposition of inter layer dielectric Brett E. Huff 1999-02-16