Issued Patents 2023
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11852978 | EUV lithography system with 3D sensing and tunning modules | Tai-Yu Chen, Tzu-Jung Pan, Kuan-Hung Chen, Sheng-Kang Yu, Li-Jui Chen +1 more | 2023-12-26 |
| 11841625 | Device and method to remove debris from an extreme ultraviolet (EUV) lithography system | Chun-Han Lin, Chieh Hsieh, Sheng-Kang Yu, Heng-Hsin Liu, Li-Jui Chen | 2023-12-12 |
| 11832372 | EUV light source and apparatus for lithography | Po-Chung Cheng, Chia-Chen Chen, Jen-Yang Chung, Li-Jui Chen, Tzung-Chi Fu +1 more | 2023-11-28 |
| 11829082 | Radiation source for lithography process | Shang-Ying WU, Bo-Tsun Liu, Li-Jui Chen, Po-Chung Cheng | 2023-11-28 |
| 11822259 | Acoustic particle deflection in lithography tool | Tai-Yu Chen, Sagar Deepak Khivsara, Kai Tak Lam, Sheng-Kang Yu | 2023-11-21 |
| 11809083 | EUV photolithography system fuel source and methods of operating the same | Cheng-Hao LAI, Ming-Hsun Tsai, Hsin-Feng Chen, Wei-Shin Cheng, Yu-Kuang SUN +6 more | 2023-11-07 |
| 11792909 | Apparatus and method for generating extreme ultraviolet radiation | Wei-Chih Lai, Han-Lung Chang, Chi-Ming Yang, Bo-Tsun Liu, Li-Jui Chen +1 more | 2023-10-17 |
| 11768437 | System and method for performing extreme ultraviolet photolithography processes | Tai-Yu Chen, Sagar Deepak Khivsara, Kuo-An Liu, Chieh Hsieh, Gwan Sin Chang +5 more | 2023-09-26 |
| 11747741 | Substrate stage, substrate processing system using the same, and method for processing substrate | Yu-Huan Chen, Yu-Chih Huang, Ya-An PENG, Li-Jui Chen, Heng-Hsin Liu | 2023-09-05 |
| 11747735 | EUV vessel perimeter flow auto adjustment | Che-Chang Hsu, Sheng-Kang Yu, Li-Jui Chen, Heng-Hsin Liu | 2023-09-05 |
| 11740563 | Mask cleaning | Shu-Hao Chang, Norman Chen, Jeng-Horng Chen, Kuo-Chang Kau, Ming-Chin Chien +2 more | 2023-08-29 |
| 11703769 | Light source, EUV lithography system, and method for performing circuit layout patterning process | Chi-Ming Yang, Ssu-Yu Chen, Chieh Hsieh, Tzung-Chi Fu, Bo-Tsun Liu +2 more | 2023-07-18 |
| 11693324 | System and method for detecting debris in a photolithography system | Shih-Yu Tu, Chieh Hsieh, Li-Jui Chen, Heng-Hsin Liu | 2023-07-04 |
| 11693326 | System and method for dynamically controlling temperature of thermostatic reticles | Tzu-Jung Pan, Sheng-Kang Yu, Li-Jui Chen, Heng-Hsin Liu | 2023-07-04 |
| 11694820 | Radiation source apparatus and method for using the same | Wei-Chung Tu, Sheng-Kang Yu, Li-Jui Chen, Heng-Hsin Liu | 2023-07-04 |
| 11680958 | Particle image velocimetry of extreme ultraviolet lithography systems | En Hao Lai, Chi-Ming Yang, Li-Jui Chen, Po-Chung Cheng | 2023-06-20 |
| 11675272 | Method and apparatus for mitigating contamination | Chih-Ping YEN, Yen-Shuo Su, Chieh Hsieh, Chun-Lin Chang, Li-Jui Chen +1 more | 2023-06-13 |
| 11668999 | Optical imaging apparatus | Hai-Jo Huang, Chiang-Yuan Chuang, Cheng-Te Tseng | 2023-06-06 |
| 11662668 | Lithography contamination control | Chieh Hsieh, Tai-Yu Chen, Cho-Ying Lin, Li-Jui Chen, Heng-Hsin Liu | 2023-05-30 |
| 11650512 | Reticle cleaning device and method of use | Che-Chang Hsu, Sheng-Kang Yu, Li-Jui Chen, Heng-Hsin Liu | 2023-05-16 |
| 11653438 | Droplet collecting system and method of using the same | Yu-Fa LO, Ming-Hsun Tsai | 2023-05-16 |
| 11647578 | Lithography thermal control | Tai-Yu Chen, Cho-Ying Lin, Sagar Deepak Khivsara, Hsiang Chen, Chieh Hsieh +5 more | 2023-05-09 |
| 11632849 | Method and apparatus for mitigating contamination | Chieh Hsieh, Tai-Yu Chen, Hung-Jung Hsu, Cho-Ying Lin, Li-Jui Chen +1 more | 2023-04-18 |
| 11630393 | Apparatus and method for generating extreme ultraviolet radiation | Chieh Hsieh, Kuan-Hung Chen, Chun-Chia Hsu, Bo-Tsun Liu, Li-Jui Chen +1 more | 2023-04-18 |
| 11605477 | EUV lithography apparatus | Cheng-Hung Tsai, Sheng-Kang Yu, Heng-Hsin Liu, Li-Jui Chen | 2023-03-14 |