Issued Patents 2023
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11822237 | Method of manufacturing a semiconductor device | Ming-Hui Weng, Chen-Yu Liu, Chih-Cheng Liu, Yi-Chen Kuo, Jia-Lin WEI +5 more | 2023-11-21 |
| 11815821 | Module vessel with scrubber gutters sized to prevent overflow | Chun-Kai Chang, Yu Sheng CHIANG, Yu De LIOU, Ching-Juinn Huang, Po-Chung Cheng | 2023-11-14 |
| 11796917 | Width adjustment of EUV radiation beam | Tsung-Hsun Lee, Jian-Yuan Su, Ching-Juinn Huang, Po-Chung Cheng | 2023-10-24 |
| 11792909 | Apparatus and method for generating extreme ultraviolet radiation | Wei-Chih Lai, Han-Lung Chang, Shang-Chieh Chien, Bo-Tsun Liu, Li-Jui Chen +1 more | 2023-10-17 |
| 11784046 | Method of manufacturing a semiconductor device | Jia-Lin WEI, Ming-Hui Weng, Chih-Cheng Liu, Yi-Chen Kuo, Yen-Yu Chen +4 more | 2023-10-10 |
| 11772227 | Device and methods for chemical mechanical polishing | James Jeng-Jyi Hwang, He Hui Peng, Jiann Lih Wu | 2023-10-03 |
| 11767336 | Organometallic cluster photoresists for EUV lithography | Hsu-Kai Chang, Jui-Hsiung LIU, Jui-Hung Fu, Hsin-Yi Wu | 2023-09-26 |
| 11726405 | Photoresist for semiconductor fabrication | Chih-Cheng Liu, Yi-Chen Kuo, Yen-Yu Chen, Jr-Hung Li, Tze-Liang Lee | 2023-08-15 |
| 11703769 | Light source, EUV lithography system, and method for performing circuit layout patterning process | Ssu-Yu Chen, Shang-Chieh Chien, Chieh Hsieh, Tzung-Chi Fu, Bo-Tsun Liu +2 more | 2023-07-18 |
| 11703524 | Probing system for discrete wafer | Wen-Yuan Hsu, Sih-Ying Chang, Tsung-Po Lee, Kee-Leong Yu | 2023-07-18 |
| 11705332 | Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern | Yi-Chen Kuo, Chih-Cheng Liu, Ming-Hui Weng, Jia-Lin WEI, Yen-Yu Chen +4 more | 2023-07-18 |
| 11680958 | Particle image velocimetry of extreme ultraviolet lithography systems | En Hao Lai, Shang-Chieh Chien, Li-Jui Chen, Po-Chung Cheng | 2023-06-20 |
| 11658091 | Methods of manufacturing semiconductor packaging device and heat dissipation structure | Jia-Liang Chen, YEN-CHAO LIN | 2023-05-23 |
| 11655405 | Method of manufacturing cerium dioxide powder and cerium dioxide powder | Chung-Hsin Lu, Yong Liu, Shu-Hao Huang | 2023-05-23 |
| 11652007 | Metrology method | Su-Horng Lin | 2023-05-16 |
| 11650508 | Plasma position control for extreme ultraviolet lithography light sources | Ssu-Yu Chen, Hsin-Feng Chen, Li-Jui Chen | 2023-05-16 |
| 11602821 | Wafer polishing head, system thereof, and method using the same | James Jeng-Jyi Hwang, He Hui Peng, Jiann Lih Wu | 2023-03-14 |
| 11579531 | Organometallic cluster photoresists for EUV lithography | Hsu-Kai Chang, Jui-Hsiung LIU, Jui-Hung Fu, Hsin-Yi Wu | 2023-02-14 |
| 11573495 | Control of dynamic gas lock flow inlets of an intermediate focus cap | Chun-Kai Chang, Yu Sheng CHIANG, Yu De LIOU, Ching-Juinn Huang, Po-Chung Cheng | 2023-02-07 |