Issued Patents 2023
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11832372 | EUV light source and apparatus for lithography | Shang-Chieh Chien, Po-Chung Cheng, Chia-Chen Chen, Jen-Yang Chung, Li-Jui Chen +1 more | 2023-11-28 |
| 11737200 | Residual gain monitoring and reduction for EUV drive laser | Chun-Lin Chang, Jen-Hao Yeh, Han-Lung Chang, Bo-Tsun Liu, Li-Jui Chen +1 more | 2023-08-22 |
| 11723141 | EUV radiation generation methods and systems | Chun-Lin Chang, Jen-Hao Yeh, Bo-Tsun Liu, Li-Jui Chen, Po-Chung Cheng | 2023-08-08 |
| 11703763 | Method of lithography process using reticle container with discharging device | Hsiao-Lun Chang, Chueh-Chi Kuo, Tsung-Yen Lee, Li-Jui Chen, Po-Chung Cheng +1 more | 2023-07-18 |
| 11703769 | Light source, EUV lithography system, and method for performing circuit layout patterning process | Chi-Ming Yang, Ssu-Yu Chen, Shang-Chieh Chien, Chieh Hsieh, Bo-Tsun Liu +2 more | 2023-07-18 |
| 11698591 | System and method of discharging an EUV mask | Yi-Zhen Chen, Yen-Hsun Chen, Jhan-Hong YEH, Han-Lung Chang, Li-Jui Chen | 2023-07-11 |
| 11687011 | Reticle carrier and associated methods | Yen-Hsun Chen, Yi-Zhen Chen, Jhan-Hong YEH, Han-Lung Chang, Li-Jui Chen | 2023-06-27 |
| 11681235 | System and method for cleaning an EUV mask | Yen-Hui Li, Cheng-Han Yeh | 2023-06-20 |
| 11681234 | Mask for attracting charged particles and method for using the same | Yen-An Chen, Li-Jui Chen, Heng-Hsin Liu, Han-Lung Chang | 2023-06-20 |
| 11675280 | Lithography system and method | Hao-Yu Lan, Po-Chung Cheng, Ching-Juinn Huang, Tsung-Yen Lee | 2023-06-13 |
| 11588293 | Methods and systems for aligning master oscillator power amplifier systems | Chun-Lin Chang, Henry Tong Yee-Shian, Alan Tu, Han-Lung Chang, Bo-Tsun Liu +2 more | 2023-02-21 |