Issued Patents 2023
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11832372 | EUV light source and apparatus for lithography | Shang-Chieh Chien, Chia-Chen Chen, Jen-Yang Chung, Li-Jui Chen, Tzung-Chi Fu +1 more | 2023-11-28 |
| 11829082 | Radiation source for lithography process | Shang-Ying WU, Shang-Chieh Chien, Bo-Tsun Liu, Li-Jui Chen | 2023-11-28 |
| 11815821 | Module vessel with scrubber gutters sized to prevent overflow | Chun-Kai Chang, Yu Sheng CHIANG, Yu De LIOU, Chi-Ming Yang, Ching-Juinn Huang | 2023-11-14 |
| 11809075 | EUV lithography mask with a porous reflective multilayer structure | Chih-Tsung Shih, Shih-Chang Shih, Li-Jui Chen | 2023-11-07 |
| 11796917 | Width adjustment of EUV radiation beam | Chi-Ming Yang, Tsung-Hsun Lee, Jian-Yuan Su, Ching-Juinn Huang | 2023-10-24 |
| 11800626 | Shock wave visualization for extreme ultraviolet plasma optimization | Yen-Shuo Su, Jen-Hao Yeh, Jhan-Hong YEH, Ting-Ya CHENG, Henry Yee Shian Tong +3 more | 2023-10-24 |
| 11792909 | Apparatus and method for generating extreme ultraviolet radiation | Wei-Chih Lai, Han-Lung Chang, Chi-Ming Yang, Shang-Chieh Chien, Bo-Tsun Liu +1 more | 2023-10-17 |
| 11737200 | Residual gain monitoring and reduction for EUV drive laser | Chun-Lin Chang, Jen-Hao Yeh, Han-Lung Chang, Tzung-Chi Fu, Bo-Tsun Liu +1 more | 2023-08-22 |
| 11726413 | Overlay marks for reducing effect of bottom layer asymmetry | Hung-Chih Hsieh, Kai-Hsiung Chen | 2023-08-15 |
| 11723141 | EUV radiation generation methods and systems | Chun-Lin Chang, Jen-Hao Yeh, Tzung-Chi Fu, Bo-Tsun Liu, Li-Jui Chen | 2023-08-08 |
| 11703763 | Method of lithography process using reticle container with discharging device | Hsiao-Lun Chang, Chueh-Chi Kuo, Tsung-Yen Lee, Tzung-Chi Fu, Li-Jui Chen +1 more | 2023-07-18 |
| 11703769 | Light source, EUV lithography system, and method for performing circuit layout patterning process | Chi-Ming Yang, Ssu-Yu Chen, Shang-Chieh Chien, Chieh Hsieh, Tzung-Chi Fu +2 more | 2023-07-18 |
| 11680958 | Particle image velocimetry of extreme ultraviolet lithography systems | En Hao Lai, Chi-Ming Yang, Shang-Chieh Chien, Li-Jui Chen | 2023-06-20 |
| 11675280 | Lithography system and method | Hao-Yu Lan, Ching-Juinn Huang, Tzung-Chi Fu, Tsung-Yen Lee | 2023-06-13 |
| 11657492 | Reticle backside inspection method | Zi-Wen Chen, Chih-Tsung Shih, Li-Jui Chen, Shih-Chang Shih | 2023-05-23 |
| 11656391 | Aperture design and methods thereof | Hung-Chih Hsieh, Kai-Chiang Wu, Yen-Liang Chen, Kai-Hsiung Chen, Chih-Ming Ke | 2023-05-23 |
| 11630393 | Apparatus and method for generating extreme ultraviolet radiation | Chieh Hsieh, Kuan-Hung Chen, Chun-Chia Hsu, Shang-Chieh Chien, Bo-Tsun Liu +1 more | 2023-04-18 |
| 11617255 | Droplet generator and method of servicing extreme ultraviolet imaging tool | Wei-Chih Lai, Han-Lung Chang, Bo-Tsun Liu, Li-Jui Chen | 2023-03-28 |
| 11599030 | Droplet catcher, droplet catcher system of EUV lithography apparatus, and maintenance method of the EUV lithography apparatus | Shih-Yu Tu, Hsiao-Lun Chang, Li-Jui Chen, Han-Lung Chang | 2023-03-07 |
| 11594528 | Layout modification method for exposure manufacturing process | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen +1 more | 2023-02-28 |
| 11588293 | Methods and systems for aligning master oscillator power amplifier systems | Chun-Lin Chang, Henry Tong Yee-Shian, Alan Tu, Han-Lung Chang, Tzung-Chi Fu +2 more | 2023-02-21 |
| 11573495 | Control of dynamic gas lock flow inlets of an intermediate focus cap | Chun-Kai Chang, Yu Sheng CHIANG, Yu De LIOU, Chi-Ming Yang, Ching-Juinn Huang | 2023-02-07 |
| 11550228 | System and apparatus for lithography in semiconductor fabrication | Cheng-Kuan Wu, Li-Jui Chen, Chih-Tsung Shih | 2023-01-10 |